Growth of carbon-based nanostructures using active growth materials comprising alkali metals and/or alkaline earth metals

ABSTRACT

The instant disclosure is related to the growth of carbon-based nanostructures and associated systems and products. Certain embodiments are related to carbon-based nanostructure growth using active growth materials comprising alkali metals and/or alkaline earth metals. In some embodiments, the growth of carbon-based nanostructures is performed at relatively low temperatures.

RELATED APPLICATIONS

This application is a national stage filing under 35 U.S.C. 371 of International Patent Application No. PCT/US2017/024928, filed Mar. 30, 2017, entitled “Growth of Carbon-Based Nanostructures Using Active Growth Materials Comprising Alkali Metals and/or Alkaline Earth Metals”, which claims priority under 35 U.S.C. § 119(e) to U.S. Provisional Application No. 62/315,508, filed Mar. 30, 2016, and entitled “Growth of Carbon-Based Nanostructures Using Active Growth Materials Comprising Alkali Metals and/or Alkaline Earth Metals,” each of which is incorporated herein by reference in its entirety for all purposes.

GOVERNMENT SPONSORSHIP

This invention was made with Government support under Grant No. NNX14AL47H awarded by the NASA Goddard Space Flight Center. The Government has certain rights in the invention.

TECHNICAL FIELD

Growth of carbon-based nanostructures and associated systems and products are generally described.

BACKGROUND

The production of carbon-based nanostructures may potentially serve as an important tool in the production of a broad array of emerging applications including electronics and structural materials. Recent research has focused on the production of, for example, carbon nanotubes (CNTs) through chemical vapor deposition (CVD) and other techniques. The selection of an appropriate material on which to form the nanostructures is important when designing processes for the production of carbon nanostructures. However, many commonly used materials have one or more disadvantages associated with them.

Accordingly, improved compositions and methods are needed.

SUMMARY

The instant disclosure is related to the growth of carbon-based nanostructures and associated systems and products. Certain embodiments are related to carbon-based nanostructure growth using active growth materials comprising alkali metals and/or alkaline earth metals. In some embodiments, the growth of carbon-based nanostructures is performed at relatively low temperatures. The subject matter of the present invention involves, in some cases, interrelated products, alternative solutions to a particular problem, and/or a plurality of different uses of one or more systems and/or articles.

In one aspect, methods of growing carbon-based nanostructures are described. In some embodiments, the method comprises exposing a precursor of the carbon-based nanostructures to an active growth material comprising at least one of an alkali metal and an alkaline earth metal to grow the carbon-based nanostructures from the precursor of the carbon-based nanostructures.

In certain embodiments, the method comprises exposing a precursor of the carbon-based nanostructures to an active growth material comprising at least one of an alkali metal and an alkaline earth metal to grow the carbon-based nanostructures from the precursor of the carbon-based nanostructures, wherein the active growth material is at a temperature of less than or equal to 500° C. during the growth of the carbon-based nanostructures; and the active growth material does not contain iron or contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material to the combined number of atoms of any alkali metals and any alkaline earth metals in the active growth material is less than or equal to 3.5.

According to certain embodiments, the method comprises exposing a precursor of the carbon-based nanostructures to an active growth material comprising at least one of an alkali metal and an alkaline earth metal to grow the carbon-based nanostructures from the precursor of the carbon-based nanostructures, wherein the active growth material is at a temperature of less than or equal to 475° C. during the growth of the carbon-based nanostructures.

A method of growing carbon-based nanostructures comprises, according to some embodiments, exposing a precursor of the carbon-based nanostructures to an active growth material comprising at least one of an alkali metal and an alkaline earth metal to grow the carbon-based nanostructures from the precursor of the carbon-based nanostructures, wherein the precursor of the carbon-based nanostructures comprises both carbon dioxide and an alkyne.

Certain aspects are related to inventive articles. In some embodiments, the article comprises a substrate; a polymeric material at least partially coating the substrate; carbon-based nanostructures supported by the substrate; and an active growth material associated with the carbon-based nanostructures.

In some embodiments, the article comprises a substrate; a plurality of elongated carbon-based nanostructures supported by the substrate, the elongated carbon-based nanostructures having tortuosities of less than or equal to 5; and an active growth material associated with the carbon-based nanostructures.

Other advantages and novel features of the present invention will become apparent from the following detailed description of various non-limiting embodiments of the invention when considered in conjunction with the accompanying figures. In cases where the present specification and a document incorporated by reference include conflicting and/or inconsistent disclosure, the present specification shall control.

BRIEF DESCRIPTION OF THE DRAWINGS

Non-limiting embodiments of the present invention will be described by way of example with reference to the accompanying figures, which are schematic and are not intended to be drawn to scale. In the figures, each identical or nearly identical component illustrated is typically represented by a single numeral. For purposes of clarity, not every component is labeled in every figure, nor is every component of each embodiment of the invention shown where illustration is not necessary to allow those of ordinary skill in the art to understand the invention. In the figures:

FIG. 1A is a cross-sectional schematic illustration showing a method of growing carbon-based nanostructures, according to certain embodiments;

FIG. 1B is, in accordance with some embodiments, a cross-sectional schematic illustration showing a method of growing carbon-based nanostructures in the absence of a substrate;

FIG. 1C is, according to certain embodiments, a perspective schematic illustration showing a method of growing carbon-based nanostructures on an elongated substrate, such as an unsized or desized carbon fiber substrate;

FIG. 1D is a perspective schematic illustration showing a method of growing carbon-based nanostructures on an elongated substrate that is at least partially coated, such as a sized carbon fiber substrate, according to certain embodiments;

FIG. 2 is an exemplary cross-sectional schematic illustration showing possible interaction volumes between an active growth material and a substrate;

FIG. 3A is, according to certain embodiments, a cross-sectional schematic illustration of a highly tortuous nanostructure;

FIG. 3B is a cross-sectional schematic illustration of a moderately tortuous nanostructure, according to certain embodiments;

FIG. 3C is, in accordance with certain embodiments, a cross-sectional schematic illustration of a nanostructure having a relatively low tortuosity;

FIG. 4 is a SEM image of a desized carbon fiber, according to one set of embodiments;

FIG. 5 is a SEM image of a desized carbon fiber supporting an active growth material comprising iron after exposure to carbon-based nanostructure precursors at an elevated temperature, in which no carbon-based nanostructure growth was observed;

FIGS. 6A-6B are SEM images of desized carbon fibers supporting carbon nanotubes grown from an active growth material comprising sodium hydroxide, in accordance with certain embodiments;

FIG. 6C is, according to certain embodiments, a TEM image of a carbon-based nanostructure grown from an active growth material comprising sodium hydroxide;

FIG. 7 is, in accordance with certain embodiments, an SEM image of sized carbon fibers supporting carbon nanotubes grown from an active growth material comprising sodium hydroxide;

FIG. 8 is an SEM image of sized carbon fibers supporting carbon nanotubes grown from an active growth material comprising sodium carbonate, according to some embodiments;

FIG. 9 is an SEM image of sized carbon fibers supporting carbon nanotubes grown from an active growth material comprising sodium bicarbonate, according to certain embodiments;

FIG. 10 is, in accordance with some embodiments, an SEM image of alumina fibers supporting carbon nanotubes grown from an active growth material comprising sodium hydroxide;

FIGS. 11A-11F are SEM images of poly(styrene-alt-maleic acid)-coated glass slides supporting carbon nanotubes grown from an active growth material comprising sodium hydroxide, according to certain embodiments;

FIGS. 12A-12F are SEM images of poly(styrene-alt-maleic acid)-coated glass slides supporting carbon nanotubes grown from an active growth material comprising potassium carbonate, in accordance with some embodiments;

FIGS. 13A-13E are, according to some embodiments, SEM images of titanium supporting carbon nanotubes grown from an active growth material comprising sodium carbonate;

FIGS. 14A-14F are, in accordance with some embodiments, SEM images of titanium supporting carbon nanotubes grown from an active growth material comprising sodium bicarbonate;

FIGS. 15A-15F are SEM images of titanium supporting carbon nanotubes grown from an active growth material comprising sodium hydroxide, according to some embodiments;

FIGS. 16A-16D are SEM images of titanium supporting carbon nanotubes grown from an active growth material comprising sodium hydroxide, in accordance with certain embodiments;

FIG. 17 is a composite panel of four micrographs showing carbon nanostructure growth from a variety of active growth materials, according to some embodiments;

FIG. 18 is a composite panel of four micrographs showing carbon nanostructure growth on a variety of substrates, according to some embodiments;

FIG. 19 is a composite panel of six micrographs showing carbon nanostructure growth at a variety of temperatures, according to some embodiments;

FIG. 20 is a composite panel of six micrographs showing carbon nanostructure growth at a variety of CO₂ and C₂H₂ concentrations, according to some embodiments;

FIG. 21 is a composite panel of eight micrographs showing carbon nanostructure growth after a variety of times, according to some embodiments; and

FIG. 22 is a composite panel of four micrographs showing carbon nanostructures.

DETAILED DESCRIPTION

Systems and methods for the growth of carbon-based nanostructures are generally described. In some embodiments, the nanostructures may be grown on an active growth material. The active growth material, or a precursor thereof, can comprise, in some embodiments, at least one of an alkali metal and an alkaline earth metal. That is to say, all or part of the active growth material, or a precursor thereof, may be made up of one or more alkali metals and/or one or more alkaline earth metals, according to certain embodiments. The carbon-based nanostructures may be grown by exposing a precursor of the carbon-based nanostructures to the active growth material, in the presence or absence of a growth substrate, such that the carbon-based nanostructures are grown from the precursor. This may be achieved, for example, by exposing the precursor and the active growth material to a set of conditions that causes growth (e.g., nucleation and/or additional growth) of carbon-based nanostructures on the active growth material. In some such embodiments, one or more of the conditions can be selected to form carbon-based nanostructures from the precursor on the active growth material.

The growth of the carbon-based nanostructures may be achieved at relatively low temperatures, according to certain embodiments. For example, in some embodiments, the precursor of the carbon-based nanostructures (and/or the active growth material, and/or the optional growth substrate) may be at a temperature of less than or equal to 500° C. (or less than or equal to 475° C., or lower) during the growth of the carbon-based nanostructures. Other temperatures and temperature ranges are also possible, and are discussed further below.

According to certain embodiments, the alkaline earth metals and/or the alkali metals may make up a relatively large percentage of the active growth material, or a precursor thereof, relative to, for example, iron or other traditional catalyst materials such as other transition metals. For example, in some cases, the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the combined number of atoms of any alkali metals and any alkaline earth metals in the active growth material, or a precursor thereof, is less than or equal to 3.5. In some embodiments, the ratio of the combined number of atoms of all transition metals in the active growth material, or a precursor thereof, to the combined number of atoms of any alkali metals and any alkaline earth metals in the active growth material, or a precursor thereof, is less than or equal to 3.5.

Without wishing to be bound by any particular theory, it is believed that the use of alkali metals and/or alkaline earth metals in the active growth material can, according to certain although not necessarily all embodiments, allow for the growth of carbon-based nanostructures at relatively low temperatures. The ability to grow carbon-based nanostructures at relatively low temperatures can be advantageous as it may, according to certain although not necessarily all embodiments, reduce the amount of energy required to grow the carbon-based nanostructures and/or allow for the growth of carbon-based nanostructures on temperature sensitive substrates (e.g., polymers and other temperature sensitive substrates), as described in more detail below.

As described in more detail below, certain of the systems and methods described herein may be used to grow a variety of carbon-based nanostructures, including carbon nanotubes, carbon nanofibers, and carbon nanowires. Certain embodiments described herein may be particularly useful, in certain cases, for growing carbon nanotubes.

As noted above, certain embodiments are related to methods of growing carbon-based nanostructures. According to some embodiments, the method of growing carbon-based nanostructures comprises providing an active growth material or an active growth material precursor and exposing a precursor of the carbon-based nanostructures to the active growth material or active growth material precursor comprising at least one of an alkali metal and an alkaline earth metal to grow the carbon-based nanostructures from the precursor. It should be understood that, where active growth materials and their associated properties are described below and elsewhere herein, either or both of the active growth material itself and the active growth material precursor may have the properties described as being associated with the active growth material. In some embodiments, the active growth material and/or the active growth material precursor has these properties upon being exposed to the carbon-based nanostructure precursor. In certain embodiments, the active growth material and/or the active growth material precursor has these properties at the beginning of a heating step used to form the carbon-based nanostructures. In certain embodiments, the active growth material and/or the active growth material precursor has these properties at at least one point in time during which the material is in a chamber or other vessel within which the carbon-based nanostructures are grown.

An exemplary system 100 for growing carbon-based nanostructures is shown in FIG. 1A. In FIG. 1A, carbon-based nanostructures 102 are grown by exposing active growth material 106 to precursor 104 of carbon-based nanostructures 102. As illustrated in FIG. 1A, active growth material 106 is in contact (e.g., direct contact) with optional growth substrate 108, but in other embodiments, the active growth material is not in contact with a growth substrate. For example, in FIG. 1B, active growth material 106 is not in contact with an underlying substrate. In some embodiments, the active growth material may be in contact with the substrate prior to a growth process, but may be displaced from the substrate during a growth process by a growing carbon-based nanostructure.

Active growth material 106 (e.g., a nanoparticle of active growth material) can comprise one or more alkali metals and/or one or more alkaline earth metals. Specific examples of active growth materials are described in more detail below. According to certain embodiments, the active growth material catalyzes the growth of the carbon-based nanostructures.

It should be understood that the growth of carbon-based nanostructures can include the initial nucleation/formation of the carbon-based nanostructure and/or making an existing carbon-based nanostructure larger in size. In certain embodiments, the growth of the carbon-based nanostructures comprises nucleating or otherwise forming the carbon-based nanostructures from material that is not a carbon-based nanostructure. In some embodiments, two or more carbon-based nanostructures may nucleate or otherwise form from a material that is not a carbon-based nanostructure. The two or more carbon-based nanostructures may be the same type of carbon-based nanostructure, or may be different types of carbon-based nanostructures. In some embodiments, the growth of the carbon-based nanostructures comprises making an existing carbon-based nanostructure larger in size. The growth process can also include both of these steps, in some cases. In certain embodiments, multiple growth steps can be performed, for example, using a single active growth material to grow carbon-based nanostructures multiple times.

The precursor of the carbon-based nanostructures can be exposed to the active growth material in a number of ways. Generally, exposing the active growth material to the precursor comprises combining the precursor and the active growth material with each other such that they are in contact. According to certain embodiments, exposing the precursor of the carbon-based nanostructures to the active growth material comprises adding the precursor of the carbon-based nanostructures to the active growth material. In certain embodiments, exposing the precursor of the carbon-based nanostructures to the active growth material comprises adding the active growth material to the precursor of the carbon-based nanostructures. In still other embodiments, the precursor of the carbon-based nanostructures and the active growth material can be mixed simultaneously. Other methods of exposure are also possible. Exposing the precursor of the carbon-based nanostructures to an active growth material can occur, according to some embodiments, in a chamber or other volume. The volume in which the precursor of the carbon-based nanostructures is exposed to the active growth material may be fully enclosed, partially enclosed, or completely unenclosed.

As noted above, according to certain embodiments, the precursor of the carbon-based nanostructures can be exposed to the active growth material to grow the carbon-based nanostructures from the precursor. For example, in FIG. 1A, nanostructure precursor material 104, may be delivered to optional substrate 108 and contact or permeate the substrate surface (e.g., via arrow 112), the active growth material surface (e.g., via arrow 114), and/or the interface between the active growth material and the substrate (e.g., via arrow 110).

According to certain embodiments, carbon from the precursor of the carbon-based nanostructures may be dissociated from the precursor. The dissociation of the carbon from the precursor can, according to certain embodiments, involve the breaking of at least one covalent bond. In other cases, the dissociation of the carbon from the precursor does not involve breaking a covalent bond. The carbon dissociated from the precursor may, according to certain embodiments, chemically react to grow the carbon-based nanostructures via the formation of new covalent bonds (e.g., new carbon-carbon covalent bonds). In the growth of carbon nanotubes, for example, the nanostructure precursor material may comprise carbon, such that carbon dissociates from the precursor molecule and may be incorporated into the growing carbon nanotube via the formation of new carbon-carbon covalent bonds. Referring to FIG. 1A, according to certain embodiments, nanostructure precursor 104 may comprise carbon, such that carbon dissociates from nanostructure precursor 104 (optionally, breaking a covalent bond) and is incorporated into growing carbon-based nanostructures 102. The growing carbon-based nanostructures may, for example, extend upward from the growth substrate in general direction 116 with continued growth.

As described in more detail below, a variety of materials can be used as the precursor of the carbon-based nanostructures and as the active growth material (or a precursor of the active growth material). According to certain embodiments, carbon-based nanostructures (e.g., carbon nanotubes) may be synthesized using CO₂ and acetylene as precursors of the carbon-based nanostructures. In some such embodiments, the active growth material, or a precursor thereof, comprises nanoparticles of sodium hydroxide salts, which optionally may be arranged on a carbon fiber support (e.g., a sized, unsized, or desized carbon fiber support). Other examples of nanostructure precursor materials, active growth materials, precursors of active growth materials, and the types of carbon-based nanostructures that may be grown using these materials are described in more detail below.

In some embodiments, the method of growing carbon-based nanostructures comprises exposing the active growth material and the precursor of the carbon-based nanostructures to a set of conditions that causes growth of carbon-based nanostructures on the active growth material. Growth of the carbon-based nanostructures may comprise, for example, heating the precursor of the carbon-based nanostructures, the active growth material, or both. Other examples of suitable conditions under which the carbon-based nanostructures may be grown are described in more detail below. In some embodiments, growing carbon-based nanostructures comprises performing chemical vapor deposition (CVD) of nanostructures on the active growth material. In some embodiments, the chemical vapor deposition process may comprise a plasma chemical vapor deposition process. Chemical vapor deposition is a process known to those of ordinary skill in the art, and is explained, for example, in Dresselhaus M S, Dresselhaus G., and Avouris, P. eds. “Carbon Nanotubes: Synthesis, Structure, Properties, and Applications” (2001) Springer, which is incorporated herein by reference in its entirety. Examples of suitable nanostructure fabrication techniques are discussed in more detail in International Patent Application Serial No. PCT/US2007/011914, filed May 18, 2007, entitled “Continuous Process for the Production of Nanostructures Including Nanotubes,” published as WO 2007/136755 on Nov. 29, 2007, which is incorporated herein by reference in its entirety.

As noted above, according to certain embodiments, carbon-based nanostructures can be grown by exposing the nanostructure precursor to an active growth material. As used herein, the term “active growth material” refers to a material that, when exposed to a set of conditions selected to cause growth of nanostructures, either enables growth of nanostructures that would otherwise not occur in the absence of the active growth material under essentially identical conditions, or increases the rate of growth of nanostructures relative to the rate that would be observed under essentially identical conditions but without the active growth material. “Essentially identical conditions,” in this context, means conditions that are similar or identical (e.g., pressure, temperature, composition and concentration of species in the environment, etc.), other than the presence of the active growth material. In some embodiments, the active growth material can be part of a larger material (e.g., when the active growth material corresponds to a doped portion of a structure doped with an active material such as an alkali or alkaline earth metal the like). In other cases, the active growth material can be a single, standalone structure (e.g., when the active growth material is a particle made up of one or more alkali metal and/or one or more alkaline earth metal, etc.). In certain embodiments, the active growth material is active throughout its exposed surface. In some embodiments, the active growth material is active throughout at least some or all of its volume.

In accordance with certain embodiments, the active growth material is not incorporated into the carbon-based nanostructures during growth. For example, the active growth material, according to certain embodiments, is not covalently bonded to the carbon-based nanostructure grown from the precursor. In some embodiments, the active growth material is incorporated into the carbon-based nanostructure during growth. For example, growth may result in the formation of a material that comprises a carbon-based nanostructure surrounding the active growth material (e.g., a carbon nanotube where at least a portion of the active growth material is disposed inside the carbon nanotube, a carbon nanotube where at least a portion of the active growth material lines an inner wall of a carbon nanotube).

In some embodiments, the active growth material lowers the activation energy of the chemical reaction used to grow the carbon-based nanostructures from the precursor. According to certain embodiments, the active growth material catalyzes the chemical reaction(s) by which the carbon-based nanostructures are grown from the precursor.

In certain embodiments, the active growth material is formed from an active growth material precursor which undergoes a phase change or chemical change prior to carbon-based nanostructure growth. As noted above, it should be understood that, where active growth materials and their associated properties are described elsewhere herein, either or both of the active growth material itself and the active growth material precursor may have the properties described as being associated with the active growth material. In some embodiments, an active growth material precursor may be provided (e.g., applied to an optional substrate) in one form and then undergo a physical or chemical transition (e.g., during a heating step, during exposure to a nanostructure precursor) prior to forming the active growth material. For example, in some embodiments, the active growth material precursor may melt, become oxidized or reduced, become activated, or undergo any physical or chemical change prior to forming the active growth material. Generally, in embodiments in which the active growth material is formed from a precursor, the alkaline earth metal and/or alkali metal of the active growth material corresponds to the alkaline earth metal and/or alkali metal of the active growth material precursor from which it is formed. Of course, according to certain embodiments, the active growth material itself may have any of the properties described herein with respect to active growth materials and their precursors.

As noted above, in some embodiments, the active growth material, or a precursor thereof, comprises at least one of an alkali metal and an alkaline earth metal. In some embodiments, the active growth material, or a precursor thereof, comprises an alkali metal. For example, the active growth material, or a precursor thereof, can comprise a single alkali metal or a combination of multiple alkali metals. According to some embodiments, the active growth material, or a precursor thereof, comprises an alkaline earth metal. For example, the active growth material, or a precursor thereof, can comprise a single alkaline earth metal or a combination of multiple alkaline earth metals. In certain embodiments, the active growth material, or a precursor thereof, comprise both an alkaline earth metal (e.g., one or more alkaline earth metals) and an alkali earth metal (e.g., one or more alkaline earth metals).

The term “alkali metal” is used herein to refer to the following six chemical elements of Group 1 of the periodic table: lithium, sodium, potassium, rubidium, cesium, and francium. Elemental alkali metals are uncharged but are capable of becoming oxidized to form ions with a +1 oxidation state. In accordance with some embodiments, the active growth material, or a precursor thereof, may comprise one or more alkali metals in any oxidation state or any combination of oxidation states. In certain embodiments, the alkali metal in the active growth material, or a precursor thereof, is the cation of a salt. In certain embodiments, the alkali metal or the precursor thereof is not in the form of an oxide. In some embodiments, the alkali metal or the precursor thereof is not in the form of a chalcogenide. In certain embodiments, the alkali metal or the precursor thereof is not in the form of a carbide. In some embodiments, the alkali metal in the active growth material, or a precursor thereof, is a component of an alloy. In certain embodiments, the alkali metal in the active growth material, or a precursor thereof, is in its elemental form. Other components of active growth materials, or precursors thereof, which contain alkali metals may be one or more of atoms in any oxidation state, polyatomic ions with any charge, and molecules with any molecular weight and charge, in accordance with some embodiments. In certain embodiments, the alkali metal and/or other components of the active growth material, or a precursor thereof, may be in the same oxidation state throughout the processes of active growth material deposition and nanostructure growth. In other embodiments, the alkali metal and/or other components of the active growth material may transition from one oxidation state to another oxidation state during the processes of active growth material deposition and/or nanostructure growth. In accordance with some embodiments, the alkali metal and/or other components of the active growth material may be in the same oxidation state after nanostructure growth has been completed as before and/or during nanostructure growth. In accordance with other embodiments, the alkali metal and/or other components of the active growth material may be in a different oxidation state after nanostructure growth has been completed as before and/or during nanostructure growth.

The term “alkaline earth metal” is used herein to refer to the six chemical elements in Group 2 of the periodic table: beryllium, magnesium, calcium, strontium, barium, and radium. Elemental alkaline earth metals are uncharged but are capable of becoming oxidized to form ions with a +1 or +2 oxidation state. In accordance with some embodiments, the active growth material, or a precursor thereof, may comprise one or more alkaline earth metals in any oxidation state or any combination of oxidation states. In certain embodiments, the alkaline earth metal in the active growth material, or a precursor thereof, is the cation of a salt. In certain embodiments, the alkaline earth metal or the precursor thereof is not in the form of an oxide. In some embodiments, the alkaline earth metal or the precursor thereof is not in the form of a chalcogenide. In certain embodiments, the alkaline earth metal or the precursor thereof is not in the form of a carbide. In some embodiments, the alkaline earth metal in the active growth material, or a precursor thereof, is a component of an alloy. In certain embodiments, the alkaline earth metal in the active growth material, or a precursor thereof, is in its elemental form. Combinations of these are also possible. Other components of active growth materials, or precursors thereof, which contain alkaline earth metals may be one or more of atoms in any oxidation state, polyatomic ions with any charge, and molecules with any molecular weight and charge, in accordance with some embodiments. In certain embodiments, the alkaline earth metal and/or other components of the active growth material, or a precursor thereof, may be in the same oxidation state throughout the processes of active growth material deposition and nanostructure growth. In other embodiments, the alkaline earth metal and/or other components of the active growth material may transition from one oxidation state to another oxidation state during the processes of active growth material deposition and/or nanostructure growth. In accordance with some embodiments, the alkaline earth metal and/or other components of the active growth material may be in the same oxidation state after nanostructure growth has been completed as before and/or during nanostructure growth. In accordance with other embodiments, the alkaline earth metal and/or other components of the active growth material may be in a different oxidation state after nanostructure growth has been completed as before and/or during nanostructure growth.

In certain embodiments, the active growth material, or a precursor thereof, comprises at least one of sodium and potassium. In some such embodiments, the active growth material, or a precursor thereof, contains only sodium and no potassium. In other embodiments, the active growth material, or a precursor thereof, contains only potassium and no sodium. In other embodiments, the active growth material, or a precursor thereof, contains both sodium and potassium.

In certain embodiments, the active growth material, or a precursor thereof, comprises at least one of a hydroxide salt of an alkaline earth metal and a hydroxide salt of an alkali metal. In some embodiments, the active growth material, or a precursor thereof, comprises a hydroxide salt of an alkaline earth metal but does not comprise a hydroxide salt of an alkali metal. In certain embodiments, the active growth material, or a precursor thereof, comprises a hydroxide salt of an alkali metal but does not comprise a hydroxide salt of an alkaline earth metal. In other embodiments, the active growth material, or a precursor thereof, comprises both a hydroxide salt of an alkaline earth metal and a hydroxide salt of an alkali metal.

A hydroxide salt is a salt comprising OH⁻ ions. In some embodiments, the hydroxide salt may contain only OH⁻ anions; in other embodiments, the hydroxide salt may additionally contain other anions. The additional anions in such a salt may have any negative oxidation state, may be monatomic or polyatomic, may have any molecular weight, and may be organic ions or inorganic ions. In accordance with certain embodiments, the hydroxide salt may additionally comprise cations which are neither alkali metals nor alkaline earth metals. These cations may have any positive oxidation state, may be monatomic or polyatomic, may have any molecular weight, and may be organic ions or inorganic ions. The ratio of OH⁻ anions to the alkaline earth metal(s) and/or alkali metal(s) in the hydroxide salt generally depends upon the oxidation states of these metals, the oxidation states of the other cations and/or anions within the salt, and the overall ratios of each of the other ions to each other. The hydroxide salt may further comprise bound water in some embodiments. In other embodiments, the hydroxide salt may be water free.

According to certain embodiments, the OH⁻ ions make up at least a certain percentage of the total number of anions within the hydroxide salt. In some embodiments, the OH⁻ ions make up at least 50%, at least 75%, at least 90%, at least 95%, or at least 99% of the total number of anions within the hydroxide salt. In certain embodiments, the OH⁻ ions make up less than or equal to 100%, less than 99%, less than 95%, less than 90%, or less than 75% of the total number of anions within the hydroxide salt. Combinations of the above-referenced ranges are also possible (e.g., greater than or equal to 95% and less than or equal to 100% of the total number of anions within the hydroxide salt). Other ranges are also possible.

In certain embodiments, the active growth material, or a precursor thereof, comprises at least one of a carbonate salt of an alkaline earth metal and a carbonate salt of an alkali metal. In some embodiments, the active growth material, or a precursor thereof, comprises a carbonate salt of an alkaline earth metal but does not comprise a carbonate salt of an alkali metal. In certain embodiments, the active growth material, or a precursor thereof, comprises a carbonate salt of an alkali metal but does not comprise a carbonate salt of an alkaline earth metal. In other embodiments, the active growth material, or a precursor thereof, comprises both a carbonate salt of an alkaline earth metal and a carbonate salt of an alkali metal.

A carbonate salt is a salt comprising CO₃ ²⁻ ions. In some embodiments, the carbonate salt may contain only CO₃ ²⁻ anions; in other embodiments, the carbonate salt may additionally contain other anions. The additional anions in such a salt may have any negative oxidation state, may be monatomic or polyatomic, may have any molecular weight, and may be organic ions or inorganic ions. In accordance with certain embodiments, the carbonate salt may additionally comprise cations which are neither alkali metals nor alkaline earth metals. These cations may have any positive oxidation state, may be monatomic or polyatomic, may have any molecular weight, and may be organic ions or inorganic ions. The ratio of CO₃ ²⁻ anions to the alkaline earth metal(s) and/or alkali metal(s) in the carbonate salt generally depends upon the oxidation states of these metals, the oxidation states of the other cations and/or anions within the salt, and the overall ratios of each of the other ions to each other. The amount of CO₃ ²⁻ anions in the carbonate salt will generally be determined by the total mass of the carbonate salt and will be such that the salt has a net zero total charge. The carbonate salt may further comprise bound water in some embodiments. In other embodiments, the carbonate salt may be water free.

According to certain embodiments, the CO₃ ²⁻ ions make up at least a certain percentage of the total number of anions within the carbonate salt. In some embodiments, the CO₃ ²⁻ ions make up at least 50%, at least 75%, at least 90%, at least 95%, or at least 99% of the total number of anions within the carbonate salt. In certain embodiments, the CO₃ ²⁻ ions make up less than or equal to 100%, less than 99%, less than 95%, less than 90%, or less than 75% of the total number of anions within the carbonate salt. Combinations of the above-referenced ranges are also possible (e.g., greater than or equal to 95% and less than or equal to 100% of the total number of anions within the bicarbonate salt). Other ranges are also possible.

In certain embodiments, the active growth material, or a precursor thereof, comprises at least one of a bicarbonate salt of an alkaline earth metal and a bicarbonate salt of an alkali metal. In some embodiments, the active growth material, or a precursor thereof, comprises a bicarbonate salt of an alkaline earth metal but does not comprise a bicarbonate salt of an alkali metal. In certain embodiments, the active growth material, or a precursor thereof, comprises a bicarbonate salt of an alkali metal but does not comprise a bicarbonate salt of an alkaline earth metal. In other embodiments, the active growth material, or a precursor thereof, comprises both a bicarbonate salt of an alkaline earth metal and a bicarbonate salt of an alkali metal.

A bicarbonate salt is a salt comprising HCO₃ ⁻ ions. In some embodiments, the bicarbonate salt may contain only HCO₃ ⁻ anions; in other embodiments, the bicarbonate salt may additionally contain other anions. The additional anions in such a salt may have any negative oxidation state, may be monatomic or polyatomic, may have any molecular weight, and may be organic ions or inorganic ions. In accordance with certain embodiments, the bicarbonate salt may additionally comprise cations which are neither alkali metals nor alkaline earth metals. These cations may have any positive oxidation state, may be monatomic or polyatomic, may have any molecular weight, and may be organic ions or inorganic ions. The ratio of HCO₃ ⁻ anions to the alkaline earth metal(s) and/or alkali metal(s) in the bicarbonate salt generally depends upon the oxidation states of these metals, the oxidation states of the other cations and/or anions within the salt, and the overall ratios of each of the other ions to each other. The amount of HCO₃ ⁻ anions in the bicarbonate salt will generally be determined by the total mass of the bicarbonate salt and will be such that the salt has a net zero total charge. The bicarbonate salt may further comprise bound water in some embodiments. In other embodiments, the bicarbonate salt may be water free.

According to certain embodiments, the HCO₃ ⁻ ions make up at least a certain percentage of the total number of anions within the bicarbonate salt. In some embodiments, the HCO₃ ⁻ ions make up at least 50%, at least 75%, at least 90%, at least 95%, or at least 99% of the total number of anions within the bicarbonate salt. In certain embodiments, the HCO₃ ⁻ ions make up less than or equal to 100%, less than 99%, less than 95%, less than 90%, or less than 75% of the total number of anions within the bicarbonate salt. Combinations of the above-referenced ranges are also possible (e.g., greater than or equal to 95% and less than or equal to 100% of the total number of anions within the bicarbonate salt). Other ranges are also possible.

In certain embodiments, the active growth material, or a precursor thereof, comprises at least one of a halide salt of an alkaline earth metal and a halide salt of an alkali metal. In some embodiments, the active growth material, or a precursor thereof, comprises a halide salt of an alkaline earth metal but does not comprise a halide salt of an alkali metal. In certain embodiments, the active growth material, or a precursor thereof, comprises a halide salt of an alkali metal but does not comprise a halide salt of an alkaline earth metal. In other embodiments, the active growth material, or a precursor thereof, comprises both a halide salt of an alkaline earth metal and a halide salt of an alkali metal.

A halide salt is a salt comprising halide ions. The term “halide ion” is used herein to refer to negatively charged ions of following five chemical elements of Group 1 of the periodic table: fluorine, chlorine, bromine, iodine, and astatine. In some embodiments, the halide salt may contain only halide anions; in other embodiments, the halide salt may additionally contain other anions. The additional anions in such a salt may have any negative oxidation state, may be monatomic or polyatomic, may have any molecular weight, and may be organic ions or inorganic ions. In accordance with certain embodiments, the halide salt may additionally comprise cations which are neither alkali metals nor alkaline earth metals. These cations may have any positive oxidation state, may be monatomic or polyatomic, may have any molecular weight, and may be organic ions or inorganic ions. The ratio of halide anions to the alkaline earth metal(s) and/or alkali metal(s) in the halide salt generally depends upon the oxidation states of these metals, the oxidation states of the other cations and/or anions within the salt, and the overall ratios of each of the other ions to each other. The halide salt may further comprise bound water in some embodiments. In other embodiments, the halide salt may be water free.

According to certain embodiments, the halide ions make up at least a certain percentage of the total number of anions within the halide salt. In some embodiments, the halide ions make up at least 50%, at least 75%, at least 90%, at least 95%, or at least 99% of the total number of anions within the halide salt. In certain embodiments, the halide ions make up less than or equal to 100%, less than 99%, less than 95%, less than 90%, or less than 75% of the total number of anions within the halide salt. Combinations of the above-referenced ranges are also possible (e.g., greater than or equal to 95% and less than or equal to 100% of the total number of anions within the halide salt). Other ranges are also possible.

In certain embodiments, the active growth material, or a precursor thereof, comprises at least one of a chloride salt of an alkaline earth metal and a chloride salt of an alkali metal. In some embodiments, the active growth material, or a precursor thereof, comprises a chloride salt of an alkaline earth metal but does not comprise a chloride salt of an alkali metal. In certain embodiments, the active growth material, or a precursor thereof, comprises a chloride salt of an alkali metal but does not comprise a chloride salt of an alkaline earth metal. In other embodiments, the active growth material, or a precursor thereof, comprises both a chloride salt of an alkaline earth metal and a chloride salt of an alkali metal.

A chloride salt is a salt comprising chloride ions. In some embodiments, the chloride salt may contain only chloride anions; in other embodiments, the chloride salt may additionally contain other anions. The additional anions in such a salt may have any negative oxidation state, may be monatomic or polyatomic, may have any molecular weight, and may be organic ions or inorganic ions. In accordance with certain embodiments, the chloride salt may additionally comprise cations which are neither alkali metals nor alkaline earth metals. These cations may have any positive oxidation state, may be monatomic or polyatomic, may have any molecular weight, and may be organic ions or inorganic ions. The ratio of chloride anions to the alkaline earth metal(s) and/or alkali metal(s) in the chloride salt generally depends upon the oxidation states of these metals, the oxidation states of the other cations and/or anions within the salt, and the overall ratios of each of the other ions to each other. The chloride salt may further comprise bound water in some embodiments. In other embodiments, the chloride salt may be water free.

According to certain embodiments, the chloride ions make up at least a certain percentage of the total number of anions within the chloride salt. In some embodiments, the chloride ions make up at least 50%, at least 75%, at least 90%, at least 95%, or at least 99% of the total number of anions within the chloride salt. In certain embodiments, the chloride ions make up less than or equal to 100%, less than 99%, less than 95%, less than 90%, or less than 75% of the total number of anions within the chloride salt. Combinations of the above-referenced ranges are also possible (e.g., greater than or equal to 95% and less than or equal to 100% of the total number of anions within the chloride salt). Other ranges are also possible.

In certain embodiments, the alkali metal and/or the alkali earth metal is a cation of a salt ionically bound to an anion having a molecular weight of less than or equal to 1000 Daltons. In a salt, ions are typically bound to numerous other ions throughout the material.

In some embodiments the percentage of the total anions having a molecular weight less than or equal to 1000 Da may be less than or equal to 10%, less than or equal to 5%, less than or equal to 2%, or less than or equal to 1%. The percentage of the total anions having a molecular weight of less than or equal to 1000 Da may be identically 0%. The percentage of the total anions having a molecular weight less than or equal to 1000 Da may be greater than or equal to 0%, greater than or equal to 2%, or greater than or equal to 5%. Combinations of the above-referenced ranges are also possible (e.g., greater than or equal to 0% and less than or equal to 2%). Other ranges are also possible.

In accordance with certain embodiments, the number average molecular weight of the anions is less than or equal to 1000 Da, less than or equal to 750 Da, less than or equal to 500 Da, less than or equal to 250 Da, less than or equal to 100 Da, less than or equal to 50 Da, or less than or equal to 25 Da. The number average molecular weight of the anions may be greater than or equal to 10 Da, greater than or equal to 25 Da, greater than or equal to 50 Da, greater than or equal to 100 Da, greater than or equal to 250 Da, greater than or equal to 500 Da, or greater than or equal to 750 Da. Combinations of the above-referenced ranges are also possible (for example, greater than or equal to 50 Da and less than or equal to 250 Da). Other ranges are also possible.

In accordance with certain embodiments, the weight average molecular weight of the anions is less than or equal to 1000 Da, less than or equal to 750 Da, less than or equal to 500 Da, less than or equal to 250 Da, less than or equal to 100 Da, less than or equal to 50 Da, or less than or equal to 25 Da. The weight average molecular weight of the anions may be greater than or equal to 10 Da, greater than or equal to 25 Da, greater than or equal to 50 Da, greater than or equal to 100 Da, greater than or equal to 250 Da, greater than or equal to 500 Da, or greater than or equal to 750 Da. Combinations of the above-referenced ranges are also possible (for example, greater than or equal to 50 Da and less than or equal to 250 Da). Other ranges are also possible.

One of ordinary skill in the art will be able to determine number average molecular weights and weight average molecular weights using, for example, mass spectroscopy, nuclear magnetic resonance, and/or gel permeation chromatography (GPC).

The anions may have any chemical structure and any negative oxidation state, in accordance with certain embodiments. In some embodiments, one or more anions may be monatomic or polyatomic. The anions may be organic or inorganic, in some embodiments. Each anion may have the same chemical formula or different anions may have different coordination numbers, in accordance with certain embodiments. According to certain embodiments, the anions may have coordination numbers ranging from 4 to 12. Each anion may have the same coordination number or the anions may comprise ions of differing coordination numbers.

Non-limiting examples of compounds that may be used as active growth materials (or active growth material precursors) include, but are not limited to, calcium carbonate, sodium carbonate, sodium bicarbonate, sodium hydroxide, potassium carbonate, potassium bicarbonate, and potassium hydroxide. Additional examples of compounds that could be used in the active growth material include, but are not limited to, alloys comprising alkali metals and/or alkaline earth metals, such as sodium-potassium alloys (e.g., NaK), cobalt-sodium alloys (e.g., CoNa), and iron-potassium alloys (e.g., FeK).

In some embodiments, the active growth material, or a precursor thereof, contains a relatively low amount of iron. For example, in some embodiments, the active growth material, or a precursor thereof, does not contain iron or contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the combined number of atoms of any alkali metals and any alkaline earth metals in the active growth material, or a precursor thereof, is less than or equal to 3.5. In certain embodiments, the active growth material, or a precursor thereof, contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the combined number of atoms of any alkali metals and alkaline earth metals in the active growth material, or a precursor thereof, is less than or equal to 3.5, less than or equal to 3, less than or equal to 2.5, less than or equal to 2, less than or equal to 1, less than or equal to 0.2, less than or equal to 0.1, less than or equal to 0.05, or less than or equal to 0.01. In some embodiments, the active growth material, or a precursor thereof, contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the combined number of atoms of any alkali metals and alkaline earth metals in the active growth material, or a precursor thereof, is identically 0. Other ranges are also possible.

The ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the combined number of atoms of any alkali metals and alkaline earth metals in the active growth material, or a precursor thereof, can be calculated in the following manner. First, the total number of alkali metal atoms in the active growth material, or a precursor thereof, is determined. Then, the total number of alkaline earth metal atoms in the active growth material, or a precursor thereof, is determined. After this step, the total number of iron atoms in the active growth material, or a precursor thereof, is determined. Finally, the following formula is used to determine the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the combined number of atoms of any alkali metals and alkaline earth metals in the active growth material, or a precursor thereof:

${r_{{iron}:{{alkali}\mspace{14mu}{and}\mspace{14mu}{alkaline}}} = \frac{n_{{total}\mspace{14mu}{iron}}}{n_{{total}\mspace{14mu}{al}\;{kaline}\mspace{14mu}{earth}} + n_{{total}\mspace{14mu}{alkali}}}},$ where r_(iron:alkali and alkaline) is the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the combined number of atoms of any alkali metals and alkaline earth metals in the active growth material, or a precursor thereof; n_(total alkaline earth) is the total number of alkaline earth metal atoms in the active growth material, or a precursor thereof; n_(total alkali) is the total number of alkali metal atoms in the active growth material, or a precursor thereof; and n_(total iron) is the total number of iron atoms in the active growth material, or a precursor thereof.

In some embodiments, the active growth material, or a precursor thereof, does not contain iron or contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of any alkali metals in the active growth material, or a precursor thereof, is less than or equal to 3.5. In certain embodiments, the active growth material, or a precursor thereof, contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of any alkali metals is less than or equal to 3.5, less than or equal to 3, less than or equal to 2.5, less than or equal to 2, less than or equal to 1, less than or equal to 0.2, less than or equal to 0.1, less than or equal to 0.05, or less than or equal to 0.01. In some embodiments, the active growth material, or a precursor thereof, contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of any alkali metals is identically 0. Other ranges are also possible.

The ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of any alkali metals in the active growth material, or a precursor thereof, can be calculated in the following manner. First, the total number of alkali metal atoms in the active growth material, or a precursor thereof, is determined. After this step, the total number of iron atoms in the active growth material, or a precursor thereof, is determined. Then, the following formula is used to determine the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of any alkali metals in the active growth material, or a precursor thereof:

${r_{{iron}:{alkali}} = \frac{n_{{total}\mspace{14mu}{iron}}}{n_{{total}\mspace{14mu}{alkali}}}},$ where r_(iron:alkali) is the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of any alkali metals in the active growth material, or a precursor thereof; n_(total alkali) is the total number of alkali metal atoms in the active growth material, or a precursor thereof; and n_(total iron) is the total number of iron atoms in the active growth material, or a precursor thereof.

In some embodiments, the active growth material, or a precursor thereof, does not contain iron or contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of any alkaline earth metals in the active growth material, or a precursor thereof, is less than or equal to 3.5. In certain embodiments, the active growth material, or a precursor thereof, contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of any alkaline earth metals is less than or equal to 3.5, less than or equal to 3, less than or equal to 2.5, less than or equal to 2, less than or equal to 1, less than or equal to 0.2, less than or equal to 0.1, less than or equal to 0.05, or less than or equal to 0.01. In some embodiments, the active growth material, or a precursor thereof, contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of any alkaline earth metals is identically 0. Other ranges are also possible.

The ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of any alkaline earth metals in the active growth material, or a precursor thereof, can be calculated in the following manner. First, the total number of alkaline earth metal atoms in the active growth material, or a precursor thereof, is determined. After this step, the total number of iron atoms in the active growth material, or a precursor thereof, is determined. Then, the following formula is used to determine the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of any alkaline earth metals in the active growth material, or a precursor thereof:

${r_{{iron}:{{alkaline}\mspace{14mu}{earth}}} = \frac{n_{{total}\mspace{14mu}{iron}}}{n_{{total}\mspace{14mu}{al}\;{kaline}\mspace{14mu}{earth}}}},$ where r_(iron:alkaline earth) is the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of any alkali metals in the active growth material, or a precursor thereof; n_(total alkaline earth) is the total number of alkaline earth metal atoms in the active growth material, or a precursor thereof; and n_(total iron) is the total number of iron atoms in the active growth material, or a precursor thereof.

In some embodiments, the active growth material, or a precursor thereof, does not contain iron or contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the combined number of atoms of sodium and potassium in the active growth material, or a precursor thereof, is less than or equal to 3.5. In certain embodiments, the active growth material, or a precursor thereof, contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the combined number of atoms of sodium and potassium is less than or equal to 3.5, less than or equal to 3, less than or equal to 2.5, less than or equal to 2, less than or equal to 1, less than or equal to 0.2, less than or equal to 0.1, or less than or equal to 0.01. In some embodiments, the active growth material, or a precursor thereof, contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the combined number of atoms of sodium and potassium is identically equal to 0. Other ranges are also possible.

The ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the combined number of atoms of sodium and potassium in the active growth material, or a precursor thereof, can be calculated in the following manner. First, the total number of sodium atoms in the active growth material, or a precursor thereof, is determined. Then, the total number of potassium atoms in the active growth material, or a precursor thereof, is determined. After this step, the total number of iron atoms in the active growth material, or a precursor thereof, is determined. Finally, the following formula is used to determine the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the combined number of atoms of sodium and potassium in the active growth material, or a precursor thereof:

${r_{{iron}:{{sodium}\mspace{14mu}{and}\mspace{14mu}{potassium}}} = \frac{n_{{total}\mspace{14mu}{iron}}}{n_{{total}\mspace{14mu}{sodium}} + n_{{total}\mspace{14mu}{potassium}}}},$ where r_(iron:sodium and potassium) is the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the combined number of atoms of sodium and potassium in the active growth material, or a precursor thereof; n_(total sodium) is the total number of sodium atoms in the active growth material, or a precursor thereof; n_(total potassium) is the total number of potassium atoms in the active growth material, or a precursor thereof; and n_(total iron) is the total number of iron atoms in the active growth material, or a precursor thereof.

In some embodiments, the active growth material, or a precursor thereof, does not contain iron or contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of sodium in the active growth material, or a precursor thereof, is less than or equal to 3.5. In certain embodiments, the active growth material, or a precursor thereof, contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of sodium is less than or equal to 3.5, less than or equal to 3, less than or equal to 2.5, less than or equal to 2, less than or equal to 1, less than or equal to 0.2, less than or equal to 0.1, or less than or equal to 0.01. In some embodiments, the active growth material, or a precursor thereof, contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of sodium is identically equal to 0. Other ranges are also possible.

The ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of sodium in the active growth material, or a precursor thereof, can be calculated in the following manner. First, the total number of sodium atoms in the active growth material, or a precursor thereof, is determined. After this step, the total number of iron atoms in the active growth material, or a precursor thereof, is determined. Then, the following formula is used to determine the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms sodium in the active growth material, or a precursor thereof:

${r_{{{iron}:{sodium}}\;} = \frac{n_{{total}\mspace{14mu}{iron}}}{n_{{total}\mspace{14mu}{sodium}}}},$ where r_(iron:sodium) is the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of sodium in the active growth material, or a precursor thereof; n_(total sodium) is the total number of sodium atoms in the active growth material, or a precursor thereof; and n_(total iron) is the total number of iron atoms in the active growth material, or a precursor thereof.

In some embodiments, the active growth material, or a precursor thereof, does not contain iron or contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of potassium in the active growth material, or a precursor thereof, is less than or equal to 3.5. In certain embodiments, the active growth material, or a precursor thereof, contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of potassium is less than or equal to 3.5, less than or equal to 3, less than or equal to 2.5, less than or equal to 2, less than or equal to 1, less than or equal to 0.2, less than or equal to 0.1, or less than or equal to 0.01. In some embodiments, the active growth material, or a precursor thereof, contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of potassium is identically equal to 0. Other ranges are also possible.

The ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of potassium in the active growth material, or a precursor thereof, can be calculated in the following manner. First, the total number of potassium atoms in the active growth material, or a precursor thereof, is determined. After this step, the total number of iron atoms in the active growth material, or a precursor thereof, is determined. Then, the following formula is used to determine the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of potassium in the active growth material, or a precursor thereof:

${r_{{iron}:{potassium}} = \frac{n_{{total}\mspace{14mu}{iron}}}{n_{{total}\mspace{14mu}{potassium}}}},$ where r_(iron:potassium) is the ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of potassium in the active growth material, or a precursor thereof; n_(total potassium) is the total number of potassium atoms in the active growth material, or a precursor thereof; and n_(total iron) is the total number of iron atoms in the active growth material, or a precursor thereof.

According to some embodiments, the iron, when present, can be in the any one or more of the following forms: elemental iron, a metal alloy containing iron, and/or one or more iron salts. The iron can have any oxidation state, including −4, −3, −2, 0, +1, +2, +3, +4, +5, and +6. Other oxidation states are also possible. The iron atoms contained in the growth material can all have the same oxidation state, or can have different oxidation states. One of ordinary skill in the art will be able to determine the iron content and iron state of a given active growth material, or a precursor thereof. For example, X-ray photoelectron spectroscopy (XPS) may be used to determine the composition of an active growth material, or a precursor thereof. X-ray diffraction (XRD), optionally coupled with XPS, may be used to determine the crystal structure of an active growth material, or a precursor thereof. Secondary ion mass spectroscopy (SIMS) can be used to determine chemical composition as a function of depth.

In some embodiments, the active growth material, or a precursor thereof, contains a relatively low amount of transition metals. For example, in some embodiments, the active growth material, or a precursor thereof, does not contain transition metals or contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the combined number of atoms of any alkali metals and any alkaline earth metals in the active growth material, or a precursor thereof, is less than or equal to 3.5. The term “transition metals” is used herein to refer to the following chemical elements: scandium, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, yttrium, zirconium, niobium, molybdenum, technetium, ruthenium, rhodium, palladium, silver, cadmium, hafnium, tantalum, tungsten, rhenium, osmium, iridium, platinum, gold, mercury, rutherfordium, dubnium, seaborgium, bohrium, hassium, meitnerium, ununnilium, unununium, and ununbium. In certain embodiments, the active growth material, or a precursor thereof, contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the combined number of atoms of any alkali metals and alkaline earth metals in the active growth material, or a precursor thereof, is less than or equal to 3.5, less than or equal to 3, less than or equal to 2.5, less than or equal to 2, less than or equal to 1, less than or equal to 0.2, less than or equal to 0.1, or less than or equal to 0.01. In some embodiments, the active growth material, or a precursor thereof, contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the combined number of atoms of any alkali metals and alkaline earth metals in the active growth material, or a precursor thereof, is identically equal to 0. Other ranges are also possible.

The ratio of the total number of atoms of transition metals in the active growth material, or a precursor thereof, to the combined number of atoms of any alkali metals and alkaline earth metals in the active growth material, or a precursor thereof, can be calculated in the following manner. First, the total number of alkali metal atoms in the active growth material, or a precursor thereof, is determined. Then, the total number of alkaline earth metal atoms in the active growth material, or a precursor thereof, is determined. After this step, the total number of transition metals atoms in the active growth material, or a precursor thereof, is determined. Finally, the following formula is used to determine the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the combined number of atoms of any alkali metals and alkaline earth metals in the active growth material, or a precursor thereof:

${r_{t{ransition}\mspace{14mu}{{metals}:{{alkali}\mspace{14mu}{and}\mspace{14mu}{alkaline}}}} = \frac{n_{{total}\mspace{14mu}{transition}\mspace{14mu}{metals}}}{n_{{total}\mspace{14mu}{alkaline}\mspace{14mu}{earth}} + n_{{total}\mspace{14mu}{alkali}}}},$ where r_(transition metals:alkali and alkaline) is the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the combined number of atoms of any alkali metals and alkaline earth metals in the active growth material, or a precursor thereof; n_(total alkaline earth) is the total number of alkaline earth metal atoms in the active growth material, or a precursor thereof; n_(total alkali) is the total number of alkali metal atoms in the active growth material, or a precursor thereof; and n_(total transition metals) is the total number of transition metals atoms in the active growth material, or a precursor thereof.

In some embodiments, the active growth material, or a precursor thereof, does not contain transition metals or contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of any alkali metals in the active growth material, or a precursor thereof, is less than or equal to 3.5. In certain embodiments, the active growth material, or a precursor thereof, contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of any alkali metals is less than or equal to 3.5, less than or equal to 3, less than or equal to 2.5, less than or equal to 2, less than or equal to 1, less than or equal to 0.2, less than or equal to 0.1, or less than or equal to 0.01. In some embodiments, the active growth material, or a precursor thereof, contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of any alkali metals is identically equal to 0. Other ranges are also possible.

The ratio of the number of atoms of iron in the active growth material, or a precursor thereof, to the number of atoms of any alkali metals in the active growth material, or a precursor thereof, can be calculated in the following manner. First, the total number of alkali metal atoms in the active growth material, or a precursor thereof, is determined. After this step, the total number of transition metals atoms in the active growth material, or a precursor thereof, is determined. Then, the following formula is used to determine the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of any alkali metals in the active growth material, or a precursor thereof:

${r_{t{ransition}\mspace{14mu}{{metals}:{alkali}}} = \frac{n_{{total}\mspace{14mu}{transition}\mspace{14mu}{metals}}}{n_{{total}\mspace{14mu}{alkali}}}},$ where r_(transition metals:alkali) is the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of any alkali metals in the active growth material, or a precursor thereof; n_(total alkali) is the total number of alkali metal atoms in the active growth material, or a precursor thereof; and n_(total transition metals) is the total number of transition metals atoms in the active growth material, or a precursor thereof.

In some embodiments, the active growth material, or a precursor thereof, does not contain transition metals or contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of any alkaline earth metals in the active growth material, or a precursor thereof, is less than or equal to 3.5. In certain embodiments, the active growth material, or a precursor thereof, contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of any alkaline earth metals is less than or equal to 3.5, less than or equal to 3, less than or equal to 2.5, less than or equal to 2, less than or equal to 1, less than or equal to 0.2, less than or equal to 0.1, or less than or equal to 0.01. In some embodiments, the active growth material, or a precursor thereof, contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of any alkaline earth metals is identically equal to 0. Other ranges are also possible.

The ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of any alkaline earth metals in the active growth material, or a precursor thereof, can be calculated in the following manner. First, the total number of alkaline earth metal atoms in the active growth material, or a precursor thereof, is determined. After this step, the total number of transition metals atoms in the active growth material, or a precursor thereof, is determined. Then, the following formula is used to determine the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of any alkaline earth metals in the active growth material, or a precursor thereof:

${r_{t{ransition}\mspace{14mu}{{metals}:{{alkaline}\mspace{14mu}{earth}}}} = \frac{n_{{total}\mspace{14mu}{transition}\mspace{14mu}{metals}}}{n_{{total}\mspace{14mu}{alkaline}\mspace{14mu}{earth}}}},$ where r_(transition metals:alkaline earth) is the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of any alkaline earth metals in the active growth material, or a precursor thereof; n_(total alkaline earth) is the total number of alkaline earth metal atoms in the active growth material, or a precursor thereof; and n_(total transition metals) is the total number of transition metals atoms in the active growth material, or a precursor thereof.

In some embodiments, the active growth material, or a precursor thereof, does not contain transition metals or contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the combined number of atoms of sodium and potassium in the active growth material, or a precursor thereof, is less than or equal to 3.5. In certain embodiments, the active growth material, or a precursor thereof, contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the combined number of atoms of sodium and potassium is less than or equal to 3.5, less than or equal to 3, less than or equal to 2.5, less than or equal to 2, less than or equal to 1, less than or equal to 0.2, less than or equal to 0.1, or less than or equal to 0.01. In some embodiments, the active growth material, or a precursor thereof, contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the combined number of atoms of sodium and potassium is identically equal to 0. Other ranges are also possible.

The ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the combined number of atoms of sodium and potassium in the active growth material, or a precursor thereof, can be calculated in the following manner. First, the total number of sodium atoms in the active growth material, or a precursor thereof, is determined. Then, the total number of potassium atoms in the active growth material, or a precursor thereof, is determined. After this step, the total number of transition metals atoms in the active growth material, or a precursor thereof, is determined. Finally, the following formula is used to determine the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the combined number of atoms of sodium and potassium in the active growth material, or a precursor thereof:

${r_{{transition}\mspace{14mu}{{metals}:{{sodium}\mspace{14mu}{and}\mspace{14mu}{potassium}}}} = \frac{n_{{total}\mspace{14mu}{transition}\mspace{14mu}{metals}}}{n_{{total}\mspace{14mu}{sodium}} + n_{{total}\mspace{14mu}{potassium}}}},$ where r_(transition metals:sodium and potassium) is the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the combined number of atoms of sodium and potassium in the active growth material, or a precursor thereof; n_(total sodium) is the total number of sodium atoms in the active growth material, or a precursor thereof; n_(total potassium) is the total number of potassium atoms in the active growth material, or a precursor thereof; and n_(total transition metals) is the total number of transition metals atoms in the active growth material, or a precursor thereof.

In some embodiments, the active growth material, or a precursor thereof, does not contain transition metals or contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of sodium in the active growth material, or a precursor thereof, is less than or equal to 3.5. In certain embodiments, the active growth material, or a precursor thereof, contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of sodium is less than or equal to 3.5, less than or equal to 3, less than or equal to 2.5, less than or equal to 2, less than or equal to 1, less than or equal to 0.2, less than or equal to 0.1, or less than or equal to 0.01. In some embodiments, the active growth material, or a precursor thereof, contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of sodium is identically equal to 0. Other ranges are also possible.

The ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of sodium in the active growth material, or a precursor thereof, can be calculated in the following manner. First, the total number of sodium atoms in the active growth material, or a precursor thereof, is determined. After this step, the total number of transition metals atoms in the active growth material, or a precursor thereof, is determined. Then, the following formula is used to determine the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms sodium in the active growth material, or a precursor thereof:

${r_{t{ransition}\mspace{14mu}{{metals}:{sodium}}} = \frac{n_{{total}\mspace{14mu}{transition}\mspace{14mu}{metals}}}{n_{{total}\mspace{14mu}{sodium}}}},$ where r_(transition metals:sodium) is the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of sodium in the active growth material, or a precursor thereof; n_(total sodium) is the total number of sodium atoms in the active growth material, or a precursor thereof; and n_(total transition metals) is the total number of transition metals atoms in the active growth material, or a precursor thereof.

In some embodiments, the active growth material, or a precursor thereof, does not contain transition metals or contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of potassium in the active growth material, or a precursor thereof, is less than or equal to 3.5. In certain embodiments, the active growth material, or a precursor thereof, contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of potassium is less than or equal to 3.5, less than or equal to 3, less than or equal to 2.5, less than or equal to 2, less than or equal to 1, less than or equal to 0.2, less than or equal to 0.1, or less than or equal to 0.01. In some embodiments, the active growth material, or a precursor thereof, contains transition metals in an amount such that the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of potassium is identically equal to or 0. Other ranges are also possible.

The ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of potassium in the active growth material, or a precursor thereof, can be calculated in the following manner. First, the total number of potassium atoms in the active growth material, or a precursor thereof, is determined. After this step, the total number of transition metals atoms in the active growth material, or a precursor thereof, is determined. Then, the following formula is used to determine the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms sodium in the active growth material:

${r_{t{ransition}\mspace{14mu}{{metals}:{potassium}}} = \frac{n_{{total}\mspace{14mu}{transition}\mspace{14mu}{metals}}}{n_{{total}\mspace{14mu}{potassium}}}},$

where r_(transition metals:potassium) is the ratio of the number of atoms of transition metals in the active growth material, or a precursor thereof, to the number of atoms of potassium in the active growth material, or a precursor thereof; n_(total potassium) is the total number of potassium atoms in the active growth material, or a precursor thereof; and n_(total transition metals) is the total number of transition metals atoms in the active growth material, or a precursor thereof.

According to some embodiments, the transition metals in the active growth material, or a precursor thereof, when present, can be in the any one or more of the following forms: elemental transition metals, a metal alloy containing one or more transition metals, and/or one or more transition metal salts. The transition metals, when present in the active growth material, or a precursor thereof, can have any oxidation state, including −4, −3, −2, 0, +1, +2, +3, +4, +5, +6, and +7. Other oxidation states are also possible. The transition metal atoms contained in the growth material can all have the same oxidation state, or can have different oxidation states. One of ordinary skill in the art will be able to determine the transition metal content and transition metal state of a given active growth material, or a precursor thereof. For example, X-ray photoelectron spectroscopy (XPS) may be used to determine the composition of an active growth material, or a precursor thereof. X-ray diffraction (XRD), optionally coupled with XPS, may be used to determine the crystal structure of an active growth material, or a precursor thereof. Secondary ion mass spectroscopy (SIMS) can be used to determine chemical composition as a function of depth.

In certain embodiments, a relatively large proportion of the atoms of the active growth material, or a precursor thereof, are alkaline earth metals and/or alkali metals. In some embodiments, greater than or equal to 50%, greater than or equal to 75%, greater than or equal to 90%, greater than or equal to 95%, or greater than or equal to 99% of the atoms of the active growth material, or a precursor thereof, are alkaline earth metals and/or alkali metals. According to certain embodiments, less than or equal to 100%, less than or equal to 99%, less than or equal to 95%, less than or equal to 90%, or less than or equal to 75% of the atoms comprising the active growth material, or a precursor thereof, are alkaline earth metals and/or alkali metals. Combinations of the above-referenced ranges are also possible. Other ranges are also possible.

According to certain embodiments, at least 50% of the carbon-based nanostructures that are grown are in direct contact with at least one of an alkali metal and an alkaline earth metal (e.g., during the growth process and/or immediately following the growth process). In certain embodiments, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, at least 99%, or all of the carbon-based nanostructures that are grown are in direct contact with the at least one of an alkali metal and an alkaline earth metal (e.g., during the growth process or immediately following the growth process). In certain embodiments, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, at least 99%, or all of the carbon-based nanostructures that are grown are in direct contact with the alkaline earth metal (e.g., during the growth process or immediately following the growth process). In certain embodiments, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, at least 99%, or all of the carbon-based nanostructures that are grown are in direct contact with the alkali metal (e.g., during the growth process or immediately following the growth process). In certain embodiments, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, at least 99%, or all of the carbon-based nanostructures that are grown are in direct contact with at least one of sodium and potassium (e.g., during the growth process or immediately following the growth process). In certain embodiments, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, at least 99%, or all of the carbon-based nanostructures that are grown are in direct contact with sodium (e.g., during the growth process or immediately following the growth process). In certain embodiments, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, at least 99%, or all of the carbon-based nanostructures that are grown are in direct contact with potassium (e.g., during the growth process or immediately following the growth process). The carbon-based nanostructure can contact the alkali metal or alkaline earth metal in a manner such that the alkali metal or alkaline earth metal is located between the carbon-based nanostructures and an optional substrate, in some embodiments. In some embodiments, the carbon-based nanostructures can contact the alkali metal or alkaline earth metal in a manner such that the carbon-based nanostructure is in between the alkali metal or alkaline earth metal and an optional substrate.

Generally, materials which are in direct contact with each other are directly adjacent to each other with no intervening material.

In some embodiments, the growth of at least 50% of the carbon-based nanostructures is activated by at least one of an alkali metal and an alkaline earth metal. In certain embodiments, the growth of at least 75%, at least 90%, at least 95%, or at least 99% of the carbon-based nanostructures is activated by at least one of an alkali metal and an alkaline earth metal. According to certain embodiments, the growth of 100% of the carbon-based nanostructures is activated by at least one of an alkali metal and an alkaline earth metal. In certain embodiments, activation comprises reducing the energy barrier between the state of the carbon atoms of the precursor prior to incorporation into the carbon-based nanostructure and the state of the carbon atoms of the precursor after incorporation into the carbon-based nanostructure. Activation can comprise a substantial acceleration of the rate of growth in certain embodiments. In some embodiments, activation can cause growth to occur under conditions where growth would not occur or be significantly retarded in the absence of activation. One of ordinary skill in the art would be capable of determining the effect of the presence of a particular material on the activity of carbon-based nanostructure growth by, for example, determining the number of carbon-based nanostructures grown in the presence of the particular material, determining the number of carbon-based nanostructures grown in the absence of the particular material but under otherwise essentially identical conditions, and comparing the two amounts.

Certain, but not necessarily all, of the active growth materials described herein may possess advantages compared to other materials. For example, the active growth materials described herein can be capable of promoting nanostructure growth on challenging substrates, such as polymers, carbon, metals, and ceramics. As one example, active growth materials described herein can, according to certain embodiments, promote nanostructure growth on sized carbon fiber substrates. The active growth materials described herein may also be resistant to oxide formation, in some embodiments. The active growth materials described herein may promote growth at low temperatures, according to certain embodiments.

In some embodiments, the active growth material, or a precursor thereof, is deposited on an optional growth substrate from a liquid containing active growth material (or active material precursor) particles. Not wishing to be bound by any particular theory, the manner in which the active growth material, or a precursor thereof, leaves the liquid and is deposited onto the substrate might enhance the activity of the active growth material towards carbon nanostructure growth. For example, in some cases, an enhancement in active growth material activity might occur due to clustering of a relatively large number of active growth material (or active growth material precursor) particles. In some instances, an enhancement in active growth material activity might arise due to a change in surface morphology of one or more active growth material particles and/or due to a doping effect resulting from co-deposition of active growth material particles and dopants from the liquid.

In some embodiments, the active growth material, or a precursor thereof, may be deposited on an optional growth substrate by a vapor deposition process. For instance, the active growth material, or a precursor thereof, may be deposited by one or more of sputtering and/or evaporative deposition. In some embodiments, a vapor deposition process may be followed by one or more additional processes to form nanoparticles. The additional processes may include at least one or both of application of heat to the active growth material or precursor thereof and/or exposure of the active growth material or a precursor thereof to a chemical.

A plurality of active growth material particles, or particles of active growth material precursor, can be organized into a monolayer or multilayer film, in some instances. A monolayer or multilayer film might be prepared, for example, using the Langmuir-Schaffer or Langmuir-Blodgett methods. As a specific example, prefabricated nanoparticles can be dispersed in a carrier fluid (e.g., toluene), which can then be transferred (e.g., via a pipette) as a thin layer onto another layer of fluid (e.g., water). The carrier fluid can then be evaporated away leaving behind a film of nanoparticles. The film can then be transferred onto a substrate and used to grow carbon-based nanostructures.

In some cases, the active growth material, or a precursor thereof, may comprise a plurality of nanoscale features. As used herein, a “nanoscale feature” refers to a feature, such as a protrusion, groove or indentation, particle, or other measurable geometric feature on an article that has at least one cross-sectional dimension of less than 1 micron. In some cases, the nanoscale feature may have at least one cross-sectional dimension of less than 500 nm, less than 250 nm, less than 100 nm, less than 10 nm, less than 5 nm, less than 3 nm, less than 2 nm, less than 1 nm, between 0.3 and 10 nm, between 10 nm and 100 nm, or between 100 nm and 1 micron. Not wishing to be bound by any theory, the nanoscale feature may increase the rate at which a reaction, nucleation step, or other process involved in the formation of a nanostructure occurs. Nanoscale features can be formed, for example, by roughening the surface of an active growth material, or a precursor thereof.

The active growth material, or a precursor thereof, can comprise one particle or can comprise multiple particles. Any active growth material particles (or precursor particles) can have any size. In some embodiments, one or more active growth material particles (or precursor particles) has nanoscale dimensions for one or more of their length, width, and depth. Active growth material particles (or active growth material precursor particles) can be nanoparticles, nanowires, and/or thin films. In some instances, the active growth material, or a precursor thereof, may comprise nanoparticles. Generally, the term “nanoparticle” is used to refer to any particle having a maximum cross-sectional dimension of less than 1 micron. In some embodiments, an active growth material nanoparticle or active growth material precursor nanoparticle may have a maximum cross-sectional dimension of less than 500 nm, less than 250 nm, less than 100 nm, less than 10 nm, less than 5 nm, less than 3 nm, less than 2 nm, less than 1 nm, between 0.3 and 10 nm, between 10 nm and 100 nm, or between 100 nm and 1 micron. A plurality of active growth material nanoparticles or active growth material precursor nanoparticles may, in some cases, have an average maximum cross-sectional dimension of less than 1 micron, less than 100 nm, less than 10 nm, less than 5 nm, less than 3 nm, less than 2 nm, less than 1 nm, between 0.3 and 10 nm, between 10 nm and 100 nm, or between 100 nm and 1 micron. As used herein, the “maximum cross-sectional dimension” refers to the largest distance between two opposed boundaries of an individual structure that may be measured. The “average maximum cross-sectional dimension” of a plurality of structures refers to the number average. In accordance with certain embodiments, one or more active growth material particles or active growth material precursor particles can have micrometer or larger dimensions for one or more of their length, width, and depth.

The active growth material, or a precursor thereof, may have any shape. Non-limiting examples of acceptable shapes include spheres, cylinders, cubes, and parallelepipeds. In certain embodiments, the active growth material, or a precursor thereof, may be faceted. The active growth material, or a precursor thereof, may have morphologies with low or no symmetry in some embodiments. Active growth materials or active growth material precursors which form nanowires may have cross-sectionals that are circular, triangular, square, rectangular, pentagonal, hexagonal, heptagonal, octagonal, etc. In other embodiments, active growth materials or active growth material precursors which form nanowires may have cross-sections that have low or no symmetry. In certain embodiments in which active growth material particles or active growth material precursor particles are used, all of the active growth material particles or active growth material precursor particles may have the same or substantially similar morphologies. In other embodiments, the active growth material particles or active growth material precursor particles may comprise different or substantially different morphologies. In some instances, the active growth material, or a precursor thereof, may be deposited on an optional growth substrate in a pattern (e.g., lines, dots, or any other suitable form).

In some instances in which the active growth material (or precursor thereof) is in particulate form, the particles may be substantially the same shape and/or size (“monodisperse”). For example, the particles may have a distribution of dimensions such that the standard deviation of the maximum cross-sectional dimensions of the particles is no more than 50%, no more than 25%, no more than 10%, no more than 5%, no more than 2%, or no more than 1% of the average maximum cross-sectional dimensions of the particles. Standard deviation (lower-case sigma) is given its normal meaning in the art, and may be calculated as:

$\sigma = \sqrt{\frac{\sum\limits_{i = 1}^{n}\left( {D_{i} - D_{avg}} \right)^{2}}{n - 1}}$ wherein D_(i) is the maximum cross-sectional dimension of particle i, D_(avg) is the average of the cross-sectional dimensions of the particles, and n is the number of particles. The percentage comparisons between the standard deviation and the average maximum cross-sectional dimensions of the particles outlined above can be obtained by dividing the standard deviation by the average and multiplying by 100%.

The active growth material, or a precursor thereof, may have any atomic arrangement. In some embodiments, the active growth material, or a precursor thereof, may comprise particles or other forms which are single crystalline, polycrystalline, and/or amorphous. In certain embodiments, each particle of active growth material or active growth material precursor has the same atomic structure. In other embodiments, different particles of active growth material or active growth material precursor may have different atomic structures.

In some cases, the active growth material, or a precursor thereof, is in contact with a portion of a growth substrate comprising a material that is different from the material from which the active growth material, or a precursor thereof, is made (e.g., the portion of the active growth material, or a precursor thereof, in contact with the growth substrate). In some cases the active growth material, or a precursor thereof, is in contact with a portion of a growth substrate comprising a material that is the same as the material from which the active growth material, or a precursor thereof, is made (e.g., the portion of the active growth material, or a precursor thereof, in contact with the growth substrate).

As noted above, carbon-based nanostructures can be grown by exposing the active growth material to one or more precursors of the carbon-based nanostructures. The precursor(s) can, according to certain embodiments, participate in a chemical reaction in which carbon dissociates from the precursor and forms new covalent bonds to grow the carbon-based nanostructures.

According to some embodiments, the nanostructure precursor is present in the gas phase prior to being incorporated into the carbon-based nanostructure. For example, according to certain embodiments, gaseous acetylene and/or carbon dioxide can be used as carbon-based nanostructure precursors. The precursor of the carbon-based nanostructures need not necessarily be in the gaseous phase, however, and in certain embodiments, the precursor is in the solid and/or liquid phase (in addition to, or in place of, a gas phase precursor). In certain embodiments that comprise more than one precursor, each precursor may be in one or more phases. Different precursors may be in the same phase(s) or may be in different phases.

According to some embodiments, the precursor comprises carbon dioxide (CO₂). The carbon dioxide in the precursor can be in any state of matter, including solid, liquid, and/or gas. In certain, although not necessarily all, embodiments, a gaseous carbon dioxide precursor is used. The carbon dioxide can be in more than one of these forms, e.g., when the reaction conditions comprise a temperature and pressure when more than one phase of carbon dioxide is stable. In some embodiments, carbon dioxide is the only precursor present. In other embodiments, carbon dioxide is one of two or more precursors to which the active growth material is exposed. Without wishing to be bound by any particular theory, it has been observed that the use of carbon dioxide precursors can allow one to grow carbon-based nanostructures (e.g., carbon nanotubes) at relatively low temperatures, compared to the temperatures at which carbon-based nanostructures can be grown in the absence of the carbon dioxide but under otherwise essentially identical conditions.

According to some embodiments, the precursor comprises at least one of a hydrocarbon and an alcohol. In certain embodiments, the precursor may contain one or more hydrocarbons but no alcohols. In other embodiments, the precursor may contain one or more alcohols but no hydrocarbons. In yet other embodiments, the precursor may contain both one or more hydrocarbons and one or more alcohols. In some such embodiments, the hydrocarbon(s) and/or alcohol(s) are the only precursors present. In other embodiments, the precursor further comprises additional molecules. For example, in some embodiments, the precursor comprises carbon dioxide in addition to a hydrocarbon and/or an alcohol. In one particular set of embodiments, the precursor comprises at least one alkyne (e.g., acetylene) and carbon dioxide.

The term “hydrocarbon” is used herein to describe organic compounds consisting only of hydrogen and carbon. A hydrocarbon may be saturated or unsaturated (at one or more locations) and may have a linear, branched, monocyclic, or polycyclic structure. A hydrocarbon may be aliphatic or aromatic, and may contain one or more alkyl, alkene, and/or alkyne functional groups. In certain embodiments, the hydrocarbon is an alkane. In some embodiments, the hydrocarbon is an alkene. In certain embodiments, the hydrocarbon is an alkyne. In some embodiments, the hydrocarbon is a C₁-C₁₀ hydrocarbon, such as a C₁-C₈ hydrocarbon, a C₁-C₆ hydrocarbon, or a C₁-C₄ hydrocarbon. For example, in some embodiments, the hydrocarbon is a C₁-C₁₀ alkyne, a C₁-C₈ alkyne, a C₁-C₆ alkyne, or a C₁-C₄ alkyne. In some embodiments, the hydrocarbon is a C₁-C₁₀ alkane, a C₁-C₈ alkane, a C₁-C₆ alkane, or a C₁-C₄ alkane. In certain embodiments, the hydrocarbon is a C₁-C₁₀ alkene, a C₁-C₈ alkene, a C₁-C₆ alkene, or a C₁-C₄ alkene. The hydrocarbon may have any molecular weight. Non-limiting examples of suitable hydrocarbons include methane (CH₄), ethylene (C₂H₄), and acetylene (C₂H₂). In certain but not necessarily all embodiments, the hydrocarbon comprises acetylene.

As used herein, the term “alcohol” refers to a molecule with at least one hydroxyl (—OH) functional group. Non-limiting examples of alcohols include methanol, ethanol, (iso)propanol, and butanol. Alcohols may be saturated or unsaturated (at one or more locations) and may have a linear, branched, monocyclic, or polycyclic structure. Alcohols may be aliphatic or aromatic, and may contain one or more alkyl, alkene, and/or alkyne functional groups. In certain but not necessarily all embodiments, alcohols may comprise more than one —OH functional group. In some embodiments, the alcohol is a C₁-C₁₀ alcohol, such as a C₁-C₈ alcohol, a C₁-C₆ alcohol, or a C₁-C₄ alcohol.

In some embodiments, at least 50% of the nanostructure precursor is made up of a combination of hydrocarbons, alcohols, and carbon dioxide. In certain embodiments, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, at least 99%, or all of the nanostructure precursor is made up of a combination of hydrocarbons, alcohols, and carbon dioxide. In certain embodiments, at least 50%, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, at least 99%, or all of the nanostructure precursor is made up of a combination of hydrocarbons and carbon dioxide. In certain embodiments, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, at least 99%, or all of the nanostructure precursor is made up of a combination of alkynes (e.g., C₁-C₁₀, C₁-C₈, C₁-C₆, or C₁-C₄ alkynes) and carbon dioxide. In certain embodiments, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, at least 99%, or all of the nanostructure precursor is made up of a combination of acetylene and carbon dioxide. Other ranges are also possible.

As noted above, the nanostructure precursor material can be in any suitable phase. In one set of embodiments, the nanostructure precursor material comprises a solid. Examples of solid precursor materials include, for example, coal, coke, amorphous carbon, unpyrolyzed organic polymers (e.g., phenol-formaldehyde, resorcinol-formaldehyde, melamine-formaldehyde, etc.), partially pyrolyzed organic polymers, diamond, graphene, graphite, or any other suitable solid form of carbon. In some embodiments, the solid precursor material may contain carbon in an amount of at least 25 wt %, at least 50 wt %, at least 75 wt %, at least 85 wt %, at least 90 wt %, at least 95 wt %, at least 98 wt %, or at least 99 wt %.

In one set of embodiments, the nanostructure precursor material comprises both a solid and a non-solid (e.g., a liquid, a gas, etc.). For example, the nanostructure precursor material can comprise a solid form of carbon placed close to or in contact with the active growth material and a vapor-phase precursor material. As a specific example, the solid precursor component can be deposited on or near the active growth material as soot, amorphous carbon, graphene, or graphite, and the active growth material can be exposed to vapor comprising a hydrocarbon (e.g., methane, ethylene, acetylene, and the like). Not wishing to be bound by any particular theory, under some growth conditions, the presence of the solid precursor material can allow for nanostructure growth that might not occur in the absence of the solid precursor material. In some cases, the solid precursor material might provide a base from which the non-solid nanostructure precursor material can be added to grow the carbon-based nanostructure. For example, in some embodiments, a small portion of a carbon nanotube can be used as a starting material from which a larger nanotube can be grown using non-solid carbon nanostructure precursor material.

As noted above, certain embodiments comprise exposing the nanostructure precursor and the active growth material to a set of conditions that causes growth of carbon-based nanostructures on the active growth material. In some cases, the set of conditions may facilitate nucleation of carbon-based nanostructures during the growth process. According to certain embodiments, carbon-based nanostructures can be grown at relatively low temperatures. The ability to grow carbon-based nanostructures at relatively low temperatures can be advantageous, according to certain but not necessarily all embodiments, as the use of low temperatures can reduce the amount of energy needed to perform the growth process. According to some embodiments, the active growth material is at a temperature of less than or equal to 500° C. during the growth of the carbon-based nanostructures. In certain embodiments, the active growth material is at a temperature of less than or equal to 475° C. during the growth of the carbon-based nanostructures. The temperature of the active growth material may be less than or equal to 450° C., less than or equal to 425° C., less than or equal to 400° C., less than or equal to 350° C., less than or equal to 300° C., less than or equal to 250° C., less than or equal to 200° C., less than or equal to 150° C., or less than or equal to 100° C. during the growth of the carbon-based nanostructures, according to certain embodiments. The temperature of the active growth material during the growth of the carbon-based nanostructures may be greater than or equal to 50° C., greater than or equal to 100° C., greater than or equal to 150° C., greater than or equal to 200° C., greater than or equal to 250° C., greater than or equal to 300° C., greater than or equal to 350° C., or greater than or equal to 400° C., according to certain embodiments. Combinations of the above referenced ranges are also possible (for example, greater than or equal to 100° C. and less than or equal to 500° C.). Other ranges are also possible.

In some embodiments, the precursor of the carbon-based nanostructures is at a temperature of less than or equal to 500° C. during the growth of the carbon-based nanostructures. In certain embodiments, the precursor of the carbon-based nanostructures is at a temperature of less than or equal to 475° C. during the growth of the carbon-based nanostructures. In some embodiments, the temperature of the precursor of the carbon-based nanostructures may be less than or equal to 450° C., less than or equal to 425° C., less than or equal to 400° C., less than or equal to 350° C., less than or equal to 300° C., less than or equal to 250° C., less than or equal to 200° C., less than or equal to 150° C., or less than or equal to 100° C. during the growth of the carbon-based nanostructures. The temperature of the precursor of the carbon-based nanostructures during the growth of the carbon-based nanostructures may be greater than or equal to 50° C., greater than or equal to 100° C., greater than or equal to 150° C., greater than or equal to 200° C., greater than or equal to 250° C., greater than or equal to 300° C., greater than or equal to 350° C., or greater than or equal to 400° C., according to certain embodiments. Combinations of the above referenced ranges are also possible (for example, greater than or equal to 100° C. and less than or equal to 500° C.). Other ranges are also possible. In some embodiments, the precursor of the carbon-based nanostructures is at a temperature outside the ranges listed above during the growth of the carbon-based nanostructures.

In certain embodiments, the substrate (when present) is at a temperature of less than or equal to 500° C. during the growth of the carbon-based nanostructures. In certain embodiments, the substrate (when present) is at a temperature of less than or equal to 475° C. during the growth of the carbon-based nanostructures. The temperature of the substrate (when present) may be less than or equal to 450° C., less than or equal to 425° C., less than or equal to 400° C., less than or equal to 350° C., less than or equal to 300° C., less than or equal to 250° C., less than or equal to 200° C., less than or equal to 150° C., or less than or equal to 100° C. during the growth of the carbon-based nanostructures, according to certain embodiments. The temperature of the substrate (when present) during the growth of the carbon-based nanostructures may be greater than or equal to 50° C., greater than or equal to 100° C., greater than or equal to 150° C., greater than or equal to 200° C., greater than or equal to 250° C., greater than or equal to 300° C., greater than or equal to 350° C., or greater than or equal to 400° C., according to certain embodiments. Combinations of the above referenced ranges are also possible (for example, greater than or equal to 100° C. and less than or equal to 500° C.). Other ranges are also possible.

According to certain embodiments, carbon-based nanostructure growth can occur within a vessel within which the temperature of the enclosed space is less than or equal to 500° C. during the growth of the carbon-based nanostructures, according to certain embodiments. In certain embodiments, the enclosed space is at a temperature of less than or equal to 475° C. during the growth of the carbon-based nanostructures. The temperature of the enclosed space may be less than or equal to 450° C., less than or equal to 425° C., less than or equal to 400° C., less than or equal to 350° C., less than or equal to 300° C., less than or equal to 250° C., less than or equal to 200° C., less than or equal to 150° C., or less than or equal to 100° C. during the growth of the carbon-based nanostructures, according to certain embodiments. The temperature of the enclosed space during the growth of the carbon-based nanostructures may be greater than or equal to 50° C., greater than or equal to 100° C., greater than or equal to 150° C., greater than or equal to 200° C., greater than or equal to 250° C., greater than or equal to 300° C., greater than or equal to 350° C., or greater than or equal to 400° C., according to certain embodiments. Combinations of the above referenced ranges are also possible (for example, greater than or equal to 100° C. and less than or equal to 500° C.). Other ranges are also possible.

In certain embodiments, two or more of the active growth material, the substrate (when present), the precursor, and the vessel (when present) are at the same temperature. According to some embodiments, none of the active growth material, substrate, precursor, and vessel are at the same temperature. The temperature of any one or more components is higher or lower before and/or after growth for any period of time, in some embodiments.

In some cases, a source of external energy may be coupled with the growth apparatus to provide energy to cause the growth sites to reach the necessary temperature for growth. The source of external energy may provide thermal energy, for example, by resistively heating a wire coil in proximity to the growth sites (e.g., active growth material) or by passing a current through a conductive growth substrate. In some cases, the source of external energy may provide an electric and/or magnetic field to the substrate. In some cases, the source of external energy may be provided via magnetron heating, via laser, or via direct, resistive heating the growth substrate, or a combination of one or more of these. The source of external energy may be provided as a component of a closed loop temperature control system in some embodiments. It may be provided as part of an open loop temperature control system in some embodiments. In an illustrative embodiment, the set of conditions may comprise the temperature of the active growth material surface, the chemical composition of the atmosphere surrounding the active growth material, the flow and pressure of reactant gas(es) (e.g., nanostructure precursors) surrounding the active growth material surface and within the surrounding atmosphere, the deposition or removal of active growth materials or active growth material precursors, or other materials, on the surface of the substrate (when present), and/or optionally the rate of motion of the substrate. In some cases, the source of external energy may provide X-rays to the growth substrate (when present) and/or active growth material. Not wishing to be bound by any particular theory, the X-rays might induce oxygen deficiency into the active growth material, might activate the active growth material, and/or it might change the gas species coming into contact with the active growth material.

According to certain embodiments, exposure of the precursor of the carbon-based nanostructures to the active growth material may occur at a particular temperature, pH, solvent, chemical reagent, type of atmosphere (e.g., nitrogen, argon, oxygen, etc.), electromagnetic radiation, or the like. In some cases, the set of conditions under which the precursor of the carbon-based nanostructures is exposed to the active growth material may be selected to facilitate nucleation, growth, stabilization, removal, and/or other processing of nanostructures. In some cases, the set of conditions may be selected to facilitate reactivation, removal, and/or replacement of the active growth material. In some cases, the set of conditions may be selected to maintain the activity of the active growth material. Some embodiments may comprise a set of conditions comprising exposure to a source of external energy. The source of energy may comprise electromagnetic radiation, electrical energy, sound energy, thermal energy, or chemical energy. For example, the set of conditions comprises exposure to heat or electromagnetic radiation, resistive heating, exposure to a laser, or exposure to infrared light. In some embodiments, the set of conditions comprises exposure to a particular temperature, pressure, chemical species, and/or nanostructure precursor material.

According to certain embodiments, the growth of the carbon-based nanostructures from the precursors can occur under conditions which are selected such that carbon nanotubes are selectively produced. In many cases, conditions (e.g., temperature, pressure, etc.) that lead to the production of other carbon-based nanostructures, such as graphene, cannot be successfully used to produce nanotubes. In some cases, carbon nanotubes will not grow on traditional active growth materials from which graphene will grow.

The growth of the carbon-based nanostructures can occur, in accordance with certain embodiments, under a gaseous atmosphere. The atmosphere can comprise the precursor and, optionally, one or more carrier gases which are not consumed during carbon-based nanostructure growth. Examples of suitable carrier gases include, but are not limited to, helium, argon, and nitrogen.

In certain embodiments in which carbon dioxide and at least one hydrocarbon (e.g., at least one alkyne) are used in the precursor of the carbon-based nanostructures, the molar ratio of carbon dioxide to the hydrocarbons (e.g., alkynes) is at least 0.01:1, at least 0.05:1, at least 0.1:1; at least 0.2:1, at least 0.5:1, at least 1:1, or at least 2:1 (and/or, in certain embodiments, up to 10:1, up to 13:1, up to 15:1, up to 20:1, up to 100:1, or more). In some embodiments in which carbon dioxide and at least one hydrocarbon are used in the precursor of the carbon-based nanostructures, the molar ratio of carbon dioxide to the hydrocarbons is at least 0:1, at least 0.01:1, at least 0.05:1, at least 0.1:1; at least 0.2:1, at least 0.5:1, at least 1:1, or at least 2:1 (and/or, in certain embodiments, up to 0.01:1, up to 0.05:1, up to 0.1:1, up to 0.2:1, up to 0.5:1, up to 1:1, up to 2:1, up to 10:1, up to 13:1, up to 15:1, up to 20:1, up to 100:1, or more). For example, in some embodiments in which carbon dioxide and acetylene (C₂H₂) are used in the precursor of the carbon-based nanostructures, the molar ratio of carbon dioxide to acetylene is at least 0.01:1, at least 0.05:1, at least 0.1:1; at least 0.2:1, at least 0.5:1, at least 1:1, or at least 2:1 (and/or, in certain embodiments, up to 10:1, up to 13:1, up to 15:1, up to 20:1, up to 100:1, or more).

In some cases, exposure occurs at pressures comprising substantially atmospheric pressure (i.e., about 1 atm or 760 torr). In some cases, exposure occurs at a pressure of less than 1 atm (e.g., less than 100 torr, less than 10 torr, less than 1 torr, less than 0.1 torr, less than 0.01 torr, or lower). In some cases, the use of high pressure may be advantageous. For example, in some embodiments, exposure to a set of conditions comprises exposure at a pressure of at least 2 atm, at least 5 atm, at least 10 atm, at least 25 atm, or at least 50 atm.

Introduction of gases to a gaseous atmosphere can occur at any suitable rate. In some embodiments, any gas present during the reaction may be introduced to the gaseous atmosphere at a rate greater than or equal to 5 sccm, greater than or equal to 10 sccm, greater than or equal to 25 sccm, greater than or equal to 50 sccm, greater than or equal to 100 sccm, greater than or equal to 150 sccm, greater than or equal to 500 sccm, or greater than or equal to 1000 sccm. In some embodiments, any gas present during the reaction may be introduced to the gaseous atmosphere at a rate greater than or equal to 0.01 sccm, greater than or equal to 0.1 sccm, greater than or equal to 1 sccm, greater than or equal to 5 sccm, greater than or equal to 10 sccm, greater than or equal to 25 sccm, greater than or equal to 50 sccm, greater than or equal to 100 sccm, greater than or equal to 150 sccm, greater than or equal to 500 sccm, or greater than or equal to 1000 sccm. Any gas present during the reaction may be introduced to the gaseous atmosphere at a rate less than or equal to 1500 sccm, less than or equal to 1000 sccm, less than or equal to 500 sccm, less than or equal to 150 sccm, less than or equal to 100 sccm, less than or equal to 50 sccm, less than or equal to 25 sccm, or less than or equal to 10 sccm. Any gas present during the reaction may be introduced to the gaseous atmosphere at a rate less than or equal to 1500 sccm, less than or equal to 1000 sccm, less than or equal to 500 sccm, less than or equal to 150 sccm, less than or equal to 100 sccm, less than or equal to 50 sccm, less than or equal to 25 sccm, less than or equal to 10 sccm, less than or equal to 5 sccm, less than or equal to 1 sccm, or less than or equal to 0.1 sccm. Combinations of the above-referenced ranges are also possible (e.g., greater than or equal to 10 sccm and less than or equal to 25 sccm). Other ranges are also possible. If more than one gas is introduced, the gases may be introduced at the same rate or they may be introduced at different rates. Gases may be introduced at the same time or at different times. The gases may be introduced in any order (e.g., the precursor may be introduced prior to the introduction of any other gas, may be introduced after all other gases have been introduced, or may be introduced before some gases but after others).

The carbon-based nanostructures may grow from the precursor at any suitable rate. In some embodiments, the carbon-based nanostructures may grow from the precursor such that lengths of carbon-based nanostructures increase at a rate of greater than or equal to 0.1 microns per minute, greater than or equal to 0.25 microns per minute, greater than or equal to 0.5 microns per minute, greater than or equal to 1 micron per minute, greater than or equal to 2.5 microns per minute, or greater than or equal to 5 microns per minute. In some embodiments, the carbon-based nanostructures may grow from the precursor such that lengths of carbon-based nanostructures increase at a rate of up to 10 microns per minute, up to 50 microns per minute, up to 100 microns per minute, or more. Combinations of the above-referenced ranges are also possible (e.g., greater than or equal to 0.1 microns per minute and up to 100 microns per minute). Other ranges are also possible.

The carbon-based nanostructures may grow from the precursors for any amount of time. In certain embodiments, the growth may occur over a time period of greater than or equal to 1 minute, greater than or equal to 2 minutes, greater than or equal to 5 minutes, greater than or equal to 10 minutes, greater than or equal to 15 minutes, greater than or equal to 30 minutes, or greater than or equal to 60 minutes. The growth may occur over a period of less than or equal to 90 minutes, less than or equal to 60 minutes, less than or equal to 30 minutes, less than or equal to 15 minutes, less than or equal to 10 minutes, less than or equal to 5 minutes, or less than or equal to 2 minutes. Combinations of the above-referenced ranges are also possible (e.g., greater than or equal to 5 minutes and less than or equal to 15 minutes). Other ranges are also possible.

In certain embodiments, the active growth material, or a precursor thereof, is supported by a substrate. The substrate can be a single material or it may be a composite substrate that includes more than one component. A variety of growth substrates may be used in accordance with certain of the systems and methods described herein. Growth substrates may comprise any material capable of supporting the active growth material, or a precursor thereof, and/or the carbon-based nanostructures that are grown. The growth substrate may be selected to be inert to and/or stable under sets of conditions used in a particular process, such as nanostructure growth conditions, nanostructure removal conditions, and the like. In some cases, the growth substrate comprises a substantially flat surface. In some cases, the growth substrate comprises a substantially nonplanar surface. For example, the growth substrate may comprise a cylindrical surface.

In some embodiments, the substrate may be a solid. According to certain embodiments, the solid may be a single phase material such as a metal, ceramic, or polymer. The solid may be a composite, in some embodiments. In certain embodiments, the solid may be in any state of crystallinity including single crystalline, polycrystalline, semicrystalline, and/or amorphous.

According to certain embodiments, the substrate (or a component of a composite substrate) can be sensitive to elevated temperatures. For example, in some embodiments, the substrate (or a component of a composite substrate) can undergo a phase change or a substantial loss of mass when heated to relatively low temperatures. One advantage of certain (although not necessarily all) embodiments is that carbon-based nanostructures can be grown at relatively low temperatures, which can allow for the growth of carbon-based nanostructures on substrates that were believed to be too temperature-sensitive to support carbon-based nanostructure growth without changing phase or degrading.

According to certain embodiments, the active growth material, or a precursor thereof, is supported by a substrate that undergoes a phase change or substantial loss of mass when at a temperature below 800° C. in a 100% nitrogen atmosphere. To determine whether a particular substrate undergoes a phase change or a substantial loss of mass when at a temperature below 800° C. in a 100% nitrogen atmosphere, one would heat the substrate within the 100% nitrogen atmosphere from 25° C. at a ramp rate of 5° C./minute. If the substrate undergoes a phase change at any temperature below 800° C. under these conditions, then the substrate would be said to undergo a phase change at a temperature below 800° C. in a 100% nitrogen atmosphere. If the substrate undergoes a substantial loss of mass (i.e., a loss of mass of 0.1% or more, relative to the initial mass, such as a loss of 0.5% or more, 1% or more, 2% or more, or 5% or more) at any temperature below 800° C. under these conditions, then the substrate would be said to undergo a substantial loss of mass at a temperature below 800° C. in a 100% nitrogen atmosphere. In some embodiments, the substrate can be a substrate that undergoes a phase change or substantial loss of mass when at a temperature below 700° C., below 650° C., below 600° C., below 550° C., below 500° C., below 475° C., below 450° C., or below 425° C. in a 100% nitrogen atmosphere. Other ranges are also possible. In certain embodiments, a composite substrate is employed, and the component of the composite substrate that contacts carbon-based nanostructures can be one that undergoes a phase change or substantial loss of mass when at a temperature below 800° C., below 700° C., below 650° C., below 600° C., below 550° C., below 500° C., below 475° C., below 450° C., or below 425° C. in a 100% nitrogen atmosphere.

According to certain embodiments, the active growth material, or a precursor thereof, is supported by a substrate that undergoes a phase change or substantial change in mass when at a temperature below 650° C. in a 100% oxygen atmosphere. To determine whether a particular substrate undergoes a phase change or a substantial change in mass when at a temperature below 650° C. in a 100% oxygen atmosphere, one would heat the substrate within the 100% oxygen atmosphere from 25° C. at a ramp rate of 5° C./minute. If the substrate undergoes a phase change at any temperature below 650° C. under these conditions, then the substrate would be said to undergo a phase change at a temperature below 650° C. in a 100% oxygen atmosphere. If the substrate undergoes a substantial change in mass (i.e., a gain or loss of mass of 0.1% or more, relative to the initial mass, such as a gain or less of mass of 0.5% or more, 1% or more, 2% or more, or 5% or more) at any temperature below 650° C. under these conditions, then the substrate would be said to undergo a substantial change in mass at a temperature below 650° C. in a 100% oxygen atmosphere. In some embodiments, the substrate can be a substrate that undergoes a phase change or a substantial change in mass when at a temperature below 600° C., below 550° C., below 500° C., below 475° C., below 450° C., or below 425° C. in a 100% oxygen atmosphere. Other ranges are also possible.

In certain embodiments, a composite substrate is employed, and the component of the composite substrate that contacts carbon-based nanostructures can be one that undergoes a phase change or substantial change in mass when at a temperature below 650° C., below 600° C., below 550° C., below 500° C., below 475° C., below 450° C., or below 425° C. in a 100% oxygen atmosphere.

In some embodiments, the phase change that the substrate undergoes (e.g., within any of the temperature ranges outlined above) may comprise a glass transition, a transition between different crystal structures, a melting transition, a vaporization or condensation transition, sublimation, and/or the transition to a plasma. In some embodiments, the phase change that the substrate undergoes (e.g., within any of the temperature ranges outlined above) comprises a glass transition. In some embodiments, the phase change that the substrate undergoes (e.g., within any of the temperature ranges outlined above) comprises melting. In certain embodiments, the phase change that the substrate undergoes (e.g., within any of the temperature ranges outlined above) comprises vaporization and/or sublimation. One of ordinary skill in the art would be aware of methods for measuring a phase transition. For example, phase transitions can be assessed by differential scanning calorimetry, polarized light microscopy, rheology, visual observation, or other methods.

In some embodiments, the substrate as a whole undergoes the substantial change (e.g., increase or decrease) in mass and/or phase change under the conditions described above. In certain embodiments, a component of a composite substrate may undergo the substantial change (e.g., increase or decrease) in mass and/or phase change under the conditions described above. For example, in some embodiments, a composite substrate comprising a fiber and a sizing layer may be used as a substrate. In some such embodiments, the sizing layer of the composite substrate may undergo a phase change and/or a substantial change in mass when processed as outlined above (e.g., at at least one temperature below 800° C. when in a nitrogen and/or oxygen atmosphere, as described above).

In accordance with certain embodiments, a substantial change in mass (e.g., of a substrate or a component of a composite substrate) is a change in mass (an increase or decrease) greater than or equal to 0.1% of the initial mass (e.g., when under a nitrogen and/or oxygen atmosphere, as described above). In some embodiments, the substantial change in mass can be greater than or equal to 0.5%, 1%, 2%, 5%, 10%, 20%, or 50% of the initial mass (e.g., when under a nitrogen and/or oxygen atmosphere, as described above). One of ordinary skill in the art would also be aware of methods for measuring mass loss. For example, mass loss can be assessed by thermogravimetric analysis (under the appropriate atmosphere). In some embodiments, the substrate does not undergo a phase transition or substantial loss of mass (i.e., a loss of mass of more than 0.1%) during the nanostructure growth process. In some embodiments, the substrate does not undergo a phase transition during the nanostructure growth process. In certain embodiments, the substrate does not undergo a substantial loss of mass during the nanostructure growth process. In other embodiments, the substrate may undergo a phase transition during the nanostructure growth process.

According to some embodiments, the substrate (e.g., on which the active growth material and/or the carbon based nanostructures are supported) is a polymeric substrate. Generally, polymers are materials comprising three or more repeating mer units in their chemical structure. Polymers may comprise additional repeating units and may have any molecular weight. In some embodiments, the substrate may comprise polymers that are in the form of fibers, or may comprise polymeric fibers.

In some embodiments, the polymer of the substrate has a number average molecular weight of greater than or equal to 1,000 Da, greater than or equal to 5,000 Da, greater than or equal to 10,000 Da, greater than or equal to 25,000 Da, greater than or equal to 50,000 Da, greater than or equal to 100,000 Da, or greater than or equal to 500,000 Da. The polymer in the substrate may have a number average molecular weight less than or equal to 1,000,000 Da, less than or equal to 500,000 Da, less than or equal to 100,000 Da, less than or equal to 50,000 Da, less than or equal to 25,000 Da, less than or equal to 10,000 Da, or less than or equal to 5,000 Da. Combinations of the above-referenced ranges are also possible (e.g., greater than or equal to 10,000 Da and less than or equal to 50,000 Da). Other ranges are also possible.

In certain embodiments, the polymer of the substrate has a weight average molecular weight of greater than or equal to 1,000 Da, greater than or equal to 5,000 Da, greater than or equal to 10,000 Da, greater than or equal to 25,000 Da, greater than or equal to 50,000 Da, greater than or equal to 100,000 Da, or greater than or equal to 500,000 Da. The polymer in the substrate may have a weight average molecular weight less than or equal to 1,000,000 Da, less than or equal to 500,000 Da, less than or equal to 100,000 Da, less than or equal to 50,000 Da, less than or equal to 25,000 Da, less than or equal to 10,000 Da, or less than or equal to 5,000 Da. Combinations of the above-referenced ranges are also possible (e.g., greater than or equal to 10,000 Da and less than or equal to 50,000 Da). Other ranges are also possible.

The polymer in the substrate may have any chain structure in accordance with certain embodiments. In some embodiments, polymers may be linear, branched, and/or crosslinked molecules. Or they may be in the form of a crosslinked network. Polymers may have branches or crosslinks of any molecular weight, functionality, and/or spacing. In accordance with some embodiments, the polymers may be highly monodisperse. In accordance with other embodiments, the polymers may be polydisperse. One of ordinary skill in the art would be aware of methods for dispersity. For example, dispersity can be assessed by size-exclusion chromatography.

Polymeric substrates may have any desired mechanical property. In certain embodiments, polymeric substrates are rubbery, glassy, and/or semicrystalline.

In some embodiments, the polymers can be homopolymers, blends of polymers, and/or copolymers. Copolymers may be random copolymers, tapered copolymers, and block copolymers. In certain embodiments, block copolymers with more than three blocks may comprise two or more blocks formed from the same monomer. Blends of polymers can be phase separated or single phase, according to some embodiments.

In some embodiments, polymers may be organic polymers, inorganic polymers, or organometallic polymers. It may be advantageous, according to certain but not necessarily all embodiments, for the substrate to comprise an organic polymer material. In such embodiments, at least 50%, at least 75%, at least 90%, at least 95%, or at least 99%, or 100% of the polymeric substrate is made up of organic polymer material. In certain embodiments, polymers are of synthetic origin. Polymers of synthetic origin may be formed by either step growth or chain growth processes, and may be further functionalized after polymerization. Non-limiting examples of suitable polymers include polystyrene, polyethylene, polypropylene, poly(methyl methacrylate), polyacrylonitrile, polybutadiene, polyisoprene, poly(dimethyl siloxane), poly(vinyl chloride), poly(tetrafluoroethylene), polychloroprene, poly(vinyl alcohol), poly(ethylene oxide), polycarbonate, polyester, polyamide, polyimide, polyurethane, poly(ethylene terephthalate), polymerized phenol-formaldehyde resin, polymerized epoxy resin, para-amid fibers, silk, collagen, keratin, and gelatin. Additional examples of suitable polymers that can be used in the growth substrate include, but are not limited to, relatively high temperature fluoropolymers (e.g., Teflon®), polyetherether ketone (PEEK), and polyether ketone (PEK). In some embodiments, the polymer is not a polyelectrolyte.

In some embodiments, polymeric substrates my further comprise additives. Polymeric substrates may be in the form of a gel and comprise solvent, according to certain embodiments. In some embodiments, polymeric substrates may comprise one or more of fillers, additives, plasticizers, small molecules, and particles comprising ceramic and/or metal. In certain embodiments, greater than or equal to 50%, greater than or equal to 80%, greater than or equal to 90%, greater than or equal to 95%, or greater than or equal to 99% of the mass of the polymeric substrate may comprise polymers. Other ranges are also possible.

According to certain embodiments, the polymer may form one component of a composite substrate. For example, the polymer can be a coating formed over a fiber, such as a carbon fiber. As one non-limiting example, in some embodiments, the substrate comprises a sized carbon fiber.

In some embodiments, the substrate may comprise carbon (e.g., amorphous carbon, carbon aerogel, carbon fiber, graphite, glassy carbon, carbon-carbon composite, graphene, aggregated diamond nanorods, nanodiamond, diamond, and the like).

In accordance with certain embodiments, the substrate (e.g., on which the active growth material, or a precursor thereof, and/or the carbon-based nanostructures are supported) comprises a fiber. For example, in some embodiments, the active growth material, active growth material precursor, and/or carbon-based nanostructures are supported on a carbon fiber. In certain embodiments, the active growth material, active growth material precursor, and/or carbon-based nanostructures are supported on a glass fiber. In accordance with some embodiments, the active growth material, active growth material precursor, and/or carbon-based nanostructures are supported on fibers comprising one or more of the following materials: carbon; carbon glass; glass; alumina; basalt; metals (e.g., steel, aluminum, titanium); aramid (e.g., Kevlar®, meta-aramids such as Nomex®, p-aramids); liquid crystalline polyester; poly(p-phenylene-2,6-benzobisoxazole) (PBO); polyethylene (e.g., Spectra®); poly {2,6-diimidazo[4,5-b:4′,5′-e]pyridinylene-1,4-(2,5-dihydroxy)phenylene}; and combinations of these. In some embodiments, the active growth material, active growth material precursor, and/or carbon-based nanostructures are supported on fibers comprising at least one of polyetherether ketone (PEEK) and polyether ketone (PEK). For example, in FIG. 1C, substrate 308 is an elongated substrate, and can correspond to, for example, a fiber such as a carbon fiber. Substrate 308 can be in direct contact with active growth material 106. In some such embodiments, carbon-based nanostructures 102 can be grown from precursor 104 on active growth material 106.

As noted above, in some embodiments, the active growth material, active growth material precursor, and/or carbon based nanostructures are supported on a carbon fiber (e.g., a sized carbon fiber or an unsized carbon fiber). Any suitable type of carbon fiber can be employed including, for example, aerospace-grade carbon fibers, auto/sport grade carbon fibers, and/or microstructure carbon fibers. In certain embodiments, intermediate modulus (IM) or high modulus (HM) carbon fibers can be employed. In some embodiments, poly(acrylonitrile)-derived carbon fibers can be employed. Certain embodiments of the invention are advantageous for use with carbon fibers that carry a large degree of their tensile strengths in their outer skins (e.g., fibers in which at least 50%, at least 75%, or at least 90% of the tensile strength is imparted by the portion of the fiber located a distance away from the outer skin of the fiber of less than 0.1 times or less than 0.05 times the cross-sectional diameter of the fiber), such as aerospace grade intermediate modulus carbon fibers.

In certain embodiments, the substrate can be a carbon-based substrate. In some embodiments, the carbon-based growth substrate contains carbon in an amount of at least 75 wt %, at least 90 wt %, at least 95 wt %, or at least 99 wt %. That is to say, in some embodiments, at least 75 wt %, at least 90 wt %, at least 95 wt %, or at least 99 wt % of the carbon-based growth substrate is made of carbon.

In some embodiments, the growth substrate can be elongated. For example, the ratio of the length of the growth substrate (e.g., a fiber substrate) to the diameter or other cross-sectional dimension of the growth substrate can be, in some embodiments, at least 2:1; at least 3:1; at least 5:1; at least 10:1; at least 50:1; at least 100:1; at least 500:1; at least 1000:1; at least 10,000:1; at least 100,000:1; at least 10⁶:1; at least 10⁷:1; at least 10⁸:1; or at least 10⁹:1.

In certain embodiments, fibers (e.g., carbon fibers) used as growth substrates can have relatively large cross-sectional dimensions (e.g., relative to the nanostructures grown over the fiber substrate). For example, in certain embodiments, a fiber growth substrate can have a smallest cross-sectional dimension of at least 1 micrometer, at least 5 micrometers, or at least 10 micrometers (and/or, in certain embodiments, less than 1 mm, less than 100 micrometers, or less than 20 micrometers). Generally, the smallest cross-sectional dimension is measured perpendicularly to the length of the fiber and through the longitudinal axis of the fiber.

In certain embodiments, the active growth material, active growth material precursor, and/or carbon-based nanostructures are supported on a sized carbon fiber. The sized carbon fiber can be a single carbon fiber or part of a collection of a plurality of fibers. The collection of fibers may be, according to certain embodiments, a unidirectional collection, a tow, or a weave. Those of ordinary skill in the art are familiar with “sized” fibers (including “sized” carbon fibers). Sized fibers generally include a coating material (e.g., a polymer or other coating material) that protects the underlying fiber material (e.g., carbon) from oxygen and/or other chemicals in the surrounding environment. According to certain embodiments, the sized fiber comprise one or more polymers within the sizing layer. Non-limiting examples of polymers that may be included in the sizing of a sized fiber (e.g., a sized carbon fiber) are organosilanes, epoxies, urethanes, polyesters, oligomer polyimides, phenylethynyl-terminated imide oligomers, oligomer polyamides, polyhydroxyethers, nylons, and combinations of these. In some embodiments, the polymer of the sizing material is not a polyelectrolyte.

For example, in FIG. 1D, substrate 308 can be a fiber, such as a carbon fiber. Material 408 can be a polymeric material, such as sizing that is applied to sized fibers (e.g., sized carbon fibers). In some such embodiments, active growth material 106 can be applied to material 408. In some embodiments, carbon-based nanostructures 102 can be grown on active growth material 106 (as well as on material 408 and substrate 308) from nanostructure precursor 104. According to certain embodiments, the carbon-based nanostructures can be grown without causing material 408 to lose a substantial amount of mass (i.e., a loss of mass of 0.1% or more, or, in some cases, any of the other ranges described elsewhere herein) and/or without causing material 408 to undergo a phase change.

In certain embodiments, the active growth material, active growth material precursor, and/or carbon-based nanostructures are supported on a prepreg. As used herein, the term “prepreg” refers to one or more layers of thermoset or thermoplastic resin containing embedded fibers, for example fibers of carbon, glass, silicon carbide, and the like. In some embodiments, the thermoset material includes epoxy, rubber strengthened epoxy, BMI, PMK-15, polyesters, and/or vinylesters. In certain embodiments, the thermoplastic material includes polyamides, polyimides, polyarylene sulfide, polyetherimide, polyesterimides, polyarylenes, polysulfones, polyethersulfones, polyphenylene sulfide, polyetherimide, polypropylene, polyolefins, polyketones, polyetherketones, polyetherketoneketone, polyetheretherketones, and/or polyester. According to certain embodiments, the prepreg includes fibers that are aligned and/or interlaced (woven or braided). In some embodiments, the prepregs are arranged such the fibers of many layers are not aligned with fibers of other layers, the arrangement being dictated by directional stiffness requirements of the article to be formed. In certain embodiments, the fibers cannot be stretched appreciably longitudinally, and thus, each layer cannot be stretched appreciably in the direction along which its fibers are arranged. Exemplary prepregs include TORLON thermoplastic laminate, PEEK (polyether etherketone, Imperial Chemical Industries, PLC, England), PEKK (polyetherketone ketone, DuPont) thermoplastic, T800H/3900 2 thermoset from Toray (Japan), and AS4/3501 6 thermoset from Hercules (Magna, Utah).

In some embodiments in which substrates are employed, the active growth material (or precursor thereof), the growth substrate, and/or the conditions under which the nanostructures are grown are selected such that the amount of chemical interaction or degradation between the substrate and the active growth material is relatively small. For example, in some cases, the active growth material does not diffuse significantly into or significantly chemically react with the substrate during formation of the nanostructures. One of ordinary skill in the art will be able to determine whether a given active growth material has diffused significantly into or significantly chemically reacted with a substrate. For example, X-ray photoelectron spectroscopy (XPS), optionally with depth profiling, may be used to determine whether an active growth material has diffused into a substrate or whether elements of the substrate have diffused into the active growth material. X-ray diffraction (XRD), optionally coupled with XPS, may be used to determine whether an active growth material and a substrate have chemically reacted with each other. Secondary ion mass spectroscopy (SIMS) can be used to determine chemical composition as a function of depth.

FIG. 2 illustrates a set of embodiments in which active growth material or active growth material precursor 106 can interact with substrate 108. The volume within which the active growth material or active growth material precursor interacts with the substrate is shown as volume 118. In FIG. 2, spherical active growth material or active growth material precursor 106A interacts with substrate 108 over volume 118A, which is roughly equivalent to the original volume of active growth material or active growth material precursor 102 A. Spherical active growth material or active growth material precursor 106B interacts with substrate 108 over volume 118B, which is roughly equivalent to three times the original volume of active growth material or active growth material precursor 102B. Wetted active growth material or active growth material precursor 106C is shown interacting with substrate 108 over volume 118C, which is roughly equivalent to the original volume of active growth material or active growth material precursor 106C. In addition, substrate 108 is illustrated diffusing into active growth material or active growth material precursor 106D, with the interaction volume indicated as volume 118D. In some embodiments, chemical reaction between the active growth material or active growth material precursor and the substrate may occur, in which case the volume within which the active growth material or active growth material precursor and the substrate interact is defined by the volume of the reaction product. The volume of the chemical product may be determined, for example, via XPS analysis, using XRD to determine the chemical composition of the product and verify that it originated from the active growth material or active growth material precursor. In some embodiments, the active growth material or active growth material precursor may diffuse into the substrate or the substrate may diffuse into the active growth material or active growth material precursor, in which case the volume within which the active growth material or active growth material precursor and the substrate interact is defined by the volume over which the active growth material, active growth material precursor, and/or the substrate diffuses. The volume over which an active growth material or active growth material precursor diffuses can be determined, for example, using XPS with depth profiling.

In some embodiments, the volume within which the active growth material interacts with the substrate (e.g., the volume of the product produced via a chemical reaction between the active growth material and the substrate, the volume over which the active growth material and/or substrate diffuses into the other, etc.) is relatively small compared to the original volume of the active growth material as formed on the substrate. In some instances, the volume of the active growth material as formed on the substrate is at least 0.1%, at least 0.5%, at least 1%, at least 5%, at least 10%, at least 25%, at least 50%, at least 100%, at least 200%, at least 500%, at least 2500%, at least 5000%, at least 10,000%, at least 50,000%, or at least 100,000% greater than the volume within which the active growth material interacts with the substrate (e.g., via reaction, via diffusion, via a combination of mechanisms, etc.).

In some embodiments, the mass percentage of the active growth material that interacts with the substrate (e.g., via reaction of the active growth material and the substrate, diffusion of the active growth material into substrate, diffusion of the substrate into the active growth material, or a combination of these) is relatively low. In some embodiments, less than 50 atomic %, less than 25 atomic %, less than 10 atomic %, less than 5 atomic %, less than 2 atomic %, or less than 1 atomic % of the active growth material as formed on the substrate interacts with the substrate. The percentage of the active growth material that interacts with the substrate can be determined, for example, using XPS with depth profiling. Optionally, XRD can be employed to determine the composition of the measured material.

In some cases, the electrical resistance of the substrate does not change, from the beginning to the end of the nanostructure growth process, by more than 100%, by more than 50%, by more than 25%, by more than 10%, by more than 5%, or by more than 1% relative to the electrical resistance of a substrate exposed to essentially identical conditions in the absence of the active growth material. In some embodiments, the electrical resistance of the substrate does not decrease, from the beginning to the end of the nanostructure growth process, by more than 50%, by more than 25%, by more than 10%, by more than 5%, or by more than 1% relative to the electrical resistance of a substrate exposed to essentially identical conditions in the absence of the active growth material.

In some cases, the nanostructures may be removed from a substrate after the nanostructures are formed. For example, the act of removing may comprise transferring the nanostructures directly from the surface of the substrate to a surface of a receiving substrate. The receiving substrate may be, for example, a polymer material or a carbon fiber material. In some cases, the receiving substrate comprises a polymer material, metal, or a fiber comprising Al₂O₃, SiO₂, carbon, or a polymer material. In some cases, the receiving substrate comprises a fiber comprising Al₂O₃, SiO₂, carbon, or a polymer material. In some embodiments, the receiving substrate is a fiber weave.

Removal of the nanostructures may comprise application of a mechanical tool, mechanical or ultrasonic vibration, a chemical reagent, heat, or other sources of external energy, to the nanostructures and/or the surface of the growth substrate. In some cases, the nanostructures may be removed by application of compressed gas, for example. In some cases, the nanostructures may be removed (e.g., detached) and collected in bulk, without attaching the nanostructures to a receiving substrate, and the nanostructures may remain in their original or “as-grown” orientation and conformation (e.g., in an aligned “forest”) following removal from the growth substrate. Systems and methods for removing nanostructures from a substrate, or for transferring nanostructures from a first substrate to a second substrate, are described in International Patent Application Serial No. PCT/US2007/011914, filed May 18, 2007, entitled “Continuous Process for the Production of Nanostructures Including Nanotubes,” which is incorporated herein by reference in its entirety.

In some embodiments, the active growth material may be removed from the growth substrate and/or the nanostructures after the nanostructures are grown. Active growth material removal may be performed mechanically, for example, via treatment with a mechanical tool to scrape or grind the active growth material from a surface (e.g., of a substrate). In some cases, the first active growth material may be removed by treatment with a chemical species (e.g., chemical etching) or thermally (e.g., heating to a temperature which evaporates the active growth material). For example, in some embodiments, the active growth material may be removed via an acid etch (e.g., HCl, HF, etc.), which may, for example, selectively dissolve the active growth material. For example, HF can be used to selectively dissolve oxides. In some embodiments, the first active growth material may be removed by a combination of treatment with a chemical species and treatment with heat (e.g., the first active growth material may be heated in the presence of H₂). When heating is employed to remove the first active growth material, it may be applied by exposing the active growth material to a heated environment and/or by using an electron beam to heat the active growth material.

While growth of nanostructures using a growth substrate has been primarily described above in detail, the embodiments described herein are not so limited, and carbon-based nanostructures may be grown, in some embodiments, on an active growth material in the absence of a growth substrate. For example, FIG. 1B includes a schematic illustration of system 200 in which active growth material 106 is placed under a set of conditions selected to facilitate nanostructure growth in the absence of a substrate in contact with the active growth material. Nanostructures 102 may grow from active growth material 106 as the active growth material is exposed to the growth conditions. In some embodiments, the active growth material, or a precursor thereof, may be suspended in a fluid. For example, an active growth material, or a precursor thereof, may be suspended in a gas (e.g., aerosolized) and subsequently exposed to a carbon-containing precursor material, from which carbon nanotubes may be grown. In some cases, the active growth material, or a precursor thereof, may be suspended in a liquid (e.g., an alcohol that serves as a nanostructure precursor material) during the formation of the nanostructures. In some embodiments, unsupported active growth materials, or precursors thereof, are in contact with a gas or vacuum at every point comprising their surfaces. It should be noted that although the active growth material is depicted as a hemisphere in FIG. 1B, active growth materials with other shapes are also contemplated, such as active growth materials with spherical shapes, polygonal shapes, and the like.

As noted above, certain embodiments are related to systems and methods for growing carbon-based nanostructures. As used herein, the term “carbon-based nanostructure” refers to articles having a fused network of aromatic rings, at least one cross-sectional dimension of less than 1 micron, and comprising at least 30% carbon by mass. In some embodiments, the carbon-based nanostructures may comprise at least 40%, at least 50%, at least 60%, at least 70%, at least 80%, at least 90%, or at least 95% of carbon by mass, or more. The term “fused network” would not include, for example, a biphenyl group, wherein two phenyl rings are joined by a single bond and are not fused. Examples of carbon-based nanostructures include carbon nanotubes (e.g., single-walled carbon nanotubes, double-walled carbon nanotubes, multi-walled carbon nanotubes, etc.), carbon nanowires, carbon nanofibers, carbon nanoshells, graphene, fullerenes, and the like. In some embodiments, the carbon-based nanostructures comprise hollow carbon nanoshells and/or nanohorns.

In some embodiments, a carbon-based nanostructure may have a least one cross-sectional dimension of less than 500 nm, less than 250 nm, less than 100 nm, less than 75 nm, less than 50 nm, less than 25 nm, less than 10 nm, or, in some cases, less than 1 nm. Carbon-based nanostructures described herein may have, in some cases, a maximum cross-sectional dimension of less than 1 micron, less than 500 nm, less than 250 nm, less than 100 nm, less than 75 nm, less than 50 nm, less than 25 nm, less than 10 nm, or, in some cases, less than 1 nm.

According to certain embodiments, the carbon-based nanostructures are elongated carbon-based nanostructures. As used herein, the term “elongated carbon-based nanostructure” refers to a carbon based nanostructure structure having an aspect ratio greater than or equal to 10. In some embodiments, the elongated nanostructure can have an aspect ratio greater than or equal to 100, greater than or equal to 1000, greater than or equal to 10,000, or greater. Those skilled in the art would understand that the aspect ratio of a given structure is measured along the longitudinal axis of the elongated nanostructure, and is expressed as the ratio of the length of the longitudinal axis of the nanostructure to the maximum cross-sectional diameter of the nanostructure.

In some embodiments, the carbon-based nanostructures described herein may comprise carbon nanotubes. As used herein, the term “carbon nanotube” is given its ordinary meaning in the art and refers to a substantially cylindrical molecule or nanostructure comprising a fused network of primarily six-membered rings (e.g., six-membered aromatic rings) comprising primarily carbon atoms. In some cases, carbon nanotubes may resemble a sheet of graphite formed into a seamless cylindrical structure. In some cases, carbon nanotubes may include a wall that comprises fine-grained sp² sheets. In certain embodiments, carbon nanotubes may have turbostratic walls. It should be understood that the carbon nanotube may also comprise rings or lattice structures other than six-membered rings. Typically, at least one end of the carbon nanotube may be capped, i.e., with a curved or nonplanar aromatic structure. Carbon nanotubes may have a diameter of the order of nanometers and a length on the order of millimeters, or, on the order of tenths of microns, resulting in an aspect ratio greater than 100, 1000, 10,000, 100,000, 10⁶, 10⁷, 10⁸, 10⁹, or greater. Examples of carbon nanotubes include single-walled carbon nanotubes (SWNTs), double-walled carbon nanotubes (DWNTs), multi-walled carbon nanotubes (MWNTs) (e.g., concentric carbon nanotubes), inorganic derivatives thereof, organic derivatives thereof, and the like. In some embodiments, the carbon nanotube is a single-walled carbon nanotube. In some cases, the carbon nanotube is a multi-walled carbon nanotube (e.g., a double-walled carbon nanotube). In some cases, the carbon nanotube comprises a multi-walled or single-walled carbon nanotube with an inner diameter wider than is attainable from a traditional catalyst or other active growth material. In some cases, the carbon nanotube may have a diameter less than 1 micron, less than 500 nm, less than 250 nm, less than 100 nm, less than 50 nm, less than 25 nm, less than 10 nm, or, in some cases, less than 1 nm.

In certain embodiments, the elongated carbon-based nanostructures grown according to certain embodiments may have a relatively low tortuosity. Without wishing to be bound by any particular theory, it is believed that the use of certain active growth materials described herein (optionally, in combination with low temperature growth, and optionally using carbon dioxide and/or alkyne carbon-based nanostructure precursors) can lead to the production of elongated carbon-based nanostructures that are particularly straight, according to certain although not necessarily all embodiments. The tortuosity (or τ) may be defined as the ratio of true length of the carbon-based nanostructure (L_(cnt)) to the length of the line segment connecting one end of the carbon-based nanostructure to the other end of the carbon-based nanostructure (H); or, τ=L_(cnt)/H. In some embodiments, the elongated carbon-based nanostructures may have a tortuosity of less than or equal to 5, less than or equal to 4, less than or equal to 3, less than or equal to 2.5, less than or equal to 2.4, less than or equal to 2.3, less than or equal to 2.2, less than or equal to 2.1, less than or equal to 2, less than or equal to 1.9, less than or equal to 1.8, less than or equal to 1.7, less than or equal to 1.6, less than or equal to 1.5, less than or equal to 1.4, less than or equal to 1.3, less than or equal to 1.2, or less than or equal to 1.1. Other ranges are also possible. For example, FIG. 3A shows a highly tortuous carbon-based nanostructure 102 attached to active growth material 106; FIG. 3B shows a moderately tortuous nanostructure 102 attached to active growth material 106; and FIG. 3C shows a perfectly straight nanostructure 102 attached to active growth material 106 with a tortuosity of exactly 1. In FIGS. 3A, 3B, and 3C, L_(cnt) is indicated by 502 and H is indicated by 504.

In some embodiments, the systems and methods described herein may be used to produce substantially aligned nanostructures. The substantially aligned nanostructures may have sufficient length and/or diameter to enhance the properties of a material when arranged on or within the material. In some embodiments, the set of substantially aligned nanostructures may be formed on a surface of a substrate, and the nanostructures may be oriented such that the long axes of the nanostructures are substantially non-planar with respect to the surface of the substrate. In some cases, the long axes of the nanostructures are oriented in a substantially perpendicular direction with respect to the surface of the substrate, forming a nanostructure array or “forest.” The forest may comprise, according to some embodiments, at least 100 nanostructures, at least 1000 nanostructures, at least 10⁴ nanostructures, at least 10⁵ nanostructures, at least 10⁶ nanostructures, at least 10⁷ nanostructures, at least 10⁸ nanostructures, or more, for example, arranged in a side-by-side configuration. The alignment of nanostructures in the nanostructure “forest” may be substantially maintained, even upon subsequent processing (e.g., transfer to other surfaces and/or combining the forests with secondary materials such as polymers), in some embodiments. Systems and methods for producing aligned nanostructures and articles comprising aligned nanostructures are described, for example, in International Patent Application Serial No. PCT/US2007/011914, filed May 18, 2007, entitled “Continuous Process for the Production of Nanostructures Including Nanotubes”; and U.S. Pat. No. 7,537,825, issued on May 26, 2009, entitled “Nano-Engineered Material Architectures: Ultra-Tough Hybrid Nanocomposite System,” which are incorporated herein by reference in their entirety.

Certain aspects are related to articles comprising substrates, polymeric material, and carbon-based nanostructures. As noted above, one advantage associated with certain, but not necessarily all, embodiments described herein is that carbon-based nanostructures can be grown on materials that would otherwise be incompatible with carbon-based nanostructure growth. For example, according to certain embodiments, the ability to grow carbon-based nanostructures at relatively low temperatures can allow one to grow carbon-based nanostructures on polymeric materials and/or other temperature-sensitive materials without substantially altering and/or damaging the temperature-sensitive materials.

In one set of embodiments, the inventive article comprises a substrate, a polymeric material at least partially coating the substrate, carbon-based nanostructures supported by the substrate, and an active growth material associated with the carbon-based nanostructures. One example of such an arrangement is illustrated, for example, in FIG. 1D. In FIG. 1D, material 408 (which can be a polymeric material) at least partially coats substrate 308. While substrate 308 is illustrated in FIG. 1D as being cylindrical, the substrate could have a variety of other suitable geometries. In FIG. 1D, active growth material 106 is supported by material 408 and substrate 308. In addition, carbon-based nanostructures 102 are illustrated as being supported by material 408 and substrate 308.

In some embodiments, the active growth material can be between the carbon-based nanostructures and the polymeric material. For example, referring to FIG. 1D, active growth material 106 is located between carbon-based nanostructures 102 and material 408. In some embodiments, the carbon-based nanostructures can be between the active growth material and the polymeric material. The carbon-based nanostructures and the active growth material can be in direct contact, according to certain embodiments.

The active growth material can be any of the active growth materials described above or elsewhere herein, including active growth materials comprising at least one of an alkali metal and an alkaline earth metal. The active growth material can also have any of the forms described above or elsewhere herein.

The substrate of the article can be any of the substrates described elsewhere herein. In some embodiments, the substrate can be relatively temperature sensitive. For example, as described above, in some embodiments, the substrate (or a component of a composite substrate) undergoes a phase change or a substantial loss of mass at a temperature below 800° C. (or within any of the other temperature ranges described above or elsewhere herein) in a 100% nitrogen atmosphere. In certain embodiments, as described above, the substrate (or a component of a composite substrate) undergoes a phase change or a substantial change in mass at a temperature below 650° C. (or within any of the other temperature ranges described above or elsewhere herein) in a 100% oxygen atmosphere. In some embodiments, the substrate is an elongated substrate. For example, in some embodiments, the substrate comprises a fiber, such as a carbon fiber. In some embodiments, the substrate is a sized carbon fiber. For example, referring to FIG. 1D, substrate 308 can be a carbon fiber and material 408 can be a sizing material that at least partially coats the carbon fiber. Examples of materials from which the sizing can be made are described, for example, above with respect to sized fibers.

In some embodiments, the polymeric material covers a relatively large percentage of the external surface of the substrate. For example, in some embodiments, the polymeric material covers at least 50%, at least 75%, at least 90%, at least 95%, at least 99%, or all of the external surface of the substrate. Referring to FIG. 1D, for example, material 408 covers 100% of the external surface of the substrate 308.

According to certain embodiments, the thickness of the polymeric material can be relatively consistent over the underlying substrate. For example, in certain embodiments, the thickness of the polymeric material, over at least 80% of the surface area of the substrate that is covered by the polymeric material, does not deviate from the average thickness of the polymeric material by more than 50%, more than 40%, more than 30%, more than 20%, more than 10%, or more than 5%. In some embodiments, the thickness of the polymeric material, over at least 90% (or at least 95%, at least 98%, or at least 99%) of the surface area of the substrate that is covered by the polymeric material, does not deviate from the average thickness of the polymeric material by more than 50%, more than 40%, more than 30%, more than 20%, more than 10%, or more than 5%. Such uniformity's may be observed, for example, in the sizing layer of certain sized fibers, such as certain sized carbon fibers.

The average thickness of the polymeric material can be, according to certain embodiments, relatively thin. For example, according to certain embodiments, the average thickness of the polymeric material can be less than 1 micron, less than 500 nm, less than 200 nm, less than 100 nm, less than 50 nm, or less than 10 nm (and/or, in certain embodiments, as little as 1 nm, as little as 0.1 mm, or less).

The following examples are intended to illustrate certain embodiments of the present invention, but do not exemplify the full scope of the invention.

Example 1

In this example, desized carbon fibers are prepared for carbon-based nanostructure growth. Desized Tohotenax HTA40 fibers were rinsed once with water and then dried (under vacuum at 50 mbar and 120° C. for 20 minutes). FIG. 4 is an SEM image of the as-received desized Tohotenax HTA40 fibers.

Comparative Example 2

This example shows the lack of growth of carbon-based nanostructures from iron-comprising active growth materials at low growth temperatures. Desized carbon fibers (CF) were prepared as in Example 1. 0.05M iron nitrate in isopropanol was prepared and stirred for 60 minutes before being poured into a petri dish. Desized CF were immersed in the 0.05M iron nitrate solution for 5 minutes, and then picked up and allowed to dry at ambient temperatures for 3 hours.

A growth process was then performed as follows. The CF sample was inserted into the center of a quartz tube housed within a Lindberg/Blue M Minimite furnace. The iron nitrate was in solid salt form on the CF sample just prior to commencing the growth process. The tube was first flushed with argon for 2 minutes at 750 sccm at room temperature. The gas flow was then switched to 400 sccm of hydrogen, and 100 sccm of argon as the temperature ramped to 480° C. Once the temperature was reached, both hydrogen and argon were shut off, and 16.7 sccm of CO₂ and 167 sccm of a mixture of 10% acetylene and 90% argon was flowed through the tube for 15 minutes. Afterwards, all gases and heaters were shut off, and argon was turned back on at 750 sccm while the furnace cooled back to room temperature. FIG. 5 is an SEM image of the desized CF substrate after the conclusion of the above procedure showing no carbon-based nanostructure growth.

Example 3

In this example, growth of carbon nanotubes from a sodium hydroxide (NaOH) active growth material supported by desized CF is demonstrated. Desized CF were prepared as in Example 1. A 0.18 M solution of NaOH (Sigma Aldrich reagent grade) was prepared in deionized water, and added to a petri dish. The desized CF were immersed in the 0.18M NaOH solution for 5 minutes, and then picked up and allowed to dry at ambient temperature for 3 hours.

A growth process was performed as in Comparative Example 2. The sodium hydroxide was in solid salt form on the CF sample just prior to commencing the growth process. FIGS. 6A and 6B are SEM images showing carbon nanotube growth at the conclusion of the growth process. FIG. 6C is a TEM image of a carbon nanotube that was produced during the growth process. Carbon nanotube growth was also observed at 400° C. and at 390° C.

Example 4

This example shows growth of carbon nanotubes from a NaOH active growth material supported by sized CF. Hexcel AS4 sized CF were rinsed and dried as in Example 1. A 0.18 M solution of NaOH (Sigma Aldrich reagent grade) was prepared in deionized water, and added to a petri dish. The sized CF were immersed in the 0.18M NaOH solution for 5 minutes, and then picked up and allowed to dry at ambient temperature for 3 hours.

A growth process was performed as in Comparative Example 2. The sodium hydroxide was in solid salt form on the CF sample just prior to commencing the growth process. FIG. 7 is an SEM image showing carbon nanotubes that were produced during the growth process. Carbon nanotube growth was also observed at 400° C.

Example 5

In this example, growth of carbon nanotubes from a sodium carbonate (Na₂CO₃) active growth material supported by a desized CF substrate is shown. The desized CF substrate was a Tohotenax HTA40 fiber. Desized CF were prepared as in Example 1. A 0.09 M solution of Na₂CO₃ (VWR reagent grade) was prepared in deionized water, and added to a petri dish. The desized CF were immersed in the 0.09M Na₂CO₃ solution for 5 minutes, and then picked up and allowed to dry at ambient temperatures for 3 hours.

A growth process was performed as in Comparative Example 2. The sodium carbonate was in solid salt form on the CF sample just prior to commencing the growth process. FIG. 8 is an SEM image showing carbon nanotubes that were produced during the growth process.

Example 6

In this example, growth of carbon nanotubes from a sodium bicarbonate (NaHCO₃) active growth material supported by a desized CF substrate is demonstrated. The desized CF substrate was a Tohotenax HTA40 fiber. Desized CF were prepared as in Example 1. A 0.18 M solution of NaHCO₃(VWR reagent grade) was prepared in deionized water, and added to a petri dish. The desized CF were immersed in the 0.18M NaHCO₃ solution for 5 minutes, and then picked up and allowed to dry at ambient temperatures for 3 hours.

A growth process was performed as in Comparative Example 2. The sodium bicarbonate was in solid salt form on the CF sample just prior to commencing the growth process. FIG. 9 is an SEM image showing carbon nanotubes that were produced during the growth process.

Example 7

This example demonstrates the growth of carbon nanotubes from a NaOH active growth material supported by an alumina fiber substrate. Alumina fibers (Cotronics Corporation ULTRA TEMP 391) were used, as received, as a substrate. 0.18 M solution of NaOH (Sigma Aldrich reagent grade) was prepared in deionized water, and added to a petri dish. The alumina fibers were immersed in the 0.18M NaOH solution for 5 minutes, and then picked up and allowed to dry at ambient temperatures for 3 hours.

A growth process was performed as in Comparative Example 2. The sodium hydroxide was in solid salt form on the alumina fiber substrate just prior to commencing the growth process. FIG. 10 is an SEM image showing carbon nanotubes that were produced during the growth process. Carbon nanotube growth was also observed at 400° C.

Example 8

This example shows carbon-based nanostructure growth from a NaOH active growth material supported by a polyelectrolyte substrate. The substrate was prepared by dissolving 1.4 g of poly(styrene-alt-maleic acid) (PSMA) (Sigma Aldrich reagent grade) in 25 mL of acetone and mixing this solution with 0.18M of NaOH (prepared as in Example 3). This PSMA and NaOH solution was dropcast onto glass plates (VWR microscope slides).

A growth process was performed as in Comparative Example 2. The sodium hydroxide was in solid salt form on the substrate just prior to commencing the growth process. FIGS. 11A-F are SEM images showing carbon nanotubes that were produced during the growth process. Carbon nanotube growth was also observed at 400° C.

Example 9

In this example, carbon-based nanostructure growth from a potassium carbonate (K₂CO₃) active growth material supported by a polyelectrolyte substrate is demonstrated. The substrate was prepared by dissolving 1.4 g of PSMA in 25 mL of acetone and mixing this solution with 0.038 M of K₂CO₃ in water. This PSMA and K₂CO₃ solution was dropcast onto glass plates (VWR microscope slides) and allowed to dry at room pressure and temperature.

A growth process was performed as in Comparative Example 2. The potassium carbonate was in solid salt form on the substrate just prior to commencing the growth process. FIGS. 12A-F are SEM images showing carbon nanotubes that were produced during the growth process. Carbon nanotube growth was also observed at 400° C.

Example 10

In this example, carbon-based nanostructure growth from a Na₂CO₃ active growth material supported by a titanium substrate is shown. Titanium sheets (McMaster-Carr 9051K67 Grade 2) were sanded with 500 grit sandpaper, rinsed with deionized water, and dried under ambient conditions. A 0.18M Na₂CO₃ in water solution was drop-cast onto the titanium sheets and allowed to dry at room pressure and temperature.

A growth process was performed as in Comparative Example 2. The Na₂CO₃ was in solid salt form on the substrate just prior to commencing the growth process. FIGS. 13A-E are SEM images showing carbon nanotubes that were produced during the growth process. Carbon nanotube growth was also observed at 400° C.

Example 11

This example shows carbon-based nanostructure growth from a NaHCO₃ active growth material supported by a titanium substrate. Titanium sheets (McMaster-Carr 9051K67 Grade 2) were sanded with 500 grit sandpaper, rinsed with deionized water, and dried under ambient conditions. A 0.18M NaHCO₃ in water solution was drop-cast onto the titanium sheets and allowed to dry at room pressure and temperature.

A growth process was performed as in Comparative Example 2. The NaHCO₃ was in solid salt form on the substrate just prior to commencing the growth process. FIGS. 14A-F are SEM images showing carbon nanotubes produced during the growth process.

Example 12

This example demonstrates carbon-based nanostructure growth from a NaOH active growth material supported by a titanium substrate. Titanium sheets (McMaster-Carr 9051K67 Grade 2) were sanded with 500 grit sandpaper, rinsed with deionized water, and dried under ambient conditions. A 0.18M NaOH in methanol solution was prepared and allowed to fully dissolve over the course of 1 hour. This NaOH solution was then drop-cast onto titanium sheets and allowed to dry at room pressure and temperature.

A growth process was performed as in Comparative Example 2. The NaOH was in solid salt form on the substrate just prior to commencing the growth process. FIGS. 15A-F are SEM images showing carbon nanotubes produced during the growth process. Carbon nanotube growth was also observed at 400° C.

Example 13

This example shows carbon-based nanostructure growth from a NaOH active growth material supported by a titanium substrate. Titanium sheets (McMaster-Carr 9051K67 Grade 2) were sanded with 500 grit sandpaper, rinsed with deionized water, and dried under ambient conditions. A 0.18M NaOH in methanol solution was prepared and allowed to fully dissolve over the course of 1 hour. This NaOH solution was then spin coated onto the titanium sheets and allowed to dry at room pressure and temperature.

A growth process was performed as in Comparative Example 2. The NaOH was in solid salt form on the substrate just prior to commencing the growth process. FIGS. 16A-D are SEM images showing carbon nanotubes produced during the growth process. Carbon nanotube growth was also observed at 400° C.

Example 14

This example describes further demonstration of low-temperature synthesis of carbon nanostructures (CNS), such as CNTs, from common household Na-based compounds including NaHCO₃, Na₂CO₃, NaOH, and NaCl, found in baking soda, detergents, and table salt respectively. Coupled with a temperature reducing oxidative dehydrogenation reaction to crack acetylene, Na metal nanoparticles catalyzed growth at temperatures below 400° C. Ex situ and in situ transmission electron microscopy were utilized to characterize the spatial composition of the CNS and Na catalyst particles during growth. Unique CNS morphologies and growth phenomena were observed, including a vanishing catalyst phenomenon, i.e., CNTs without residual catalyst particles, that may be useful in applications where metal catalysts are considered contaminants.

In this example, a variety of common household items have been found to be effective in high-yield synthesis of CNT. Sodium-based compounds in particular (such as table salt, baking soda, washing soda, and lye) have allowed for the production of conformal coatings of CNT on carbon fibers. Aqueous catalyst solutions were prepared by dissolving semiconductor grade NaOH in water with the following concentrations: 0.18M, 0.018M, and 0.0018M. NaOH solutions with the same concentrations were also prepared in methanol. Likewise, aqueous solutions with equivalent concentrations were prepared for Na₂CO₃, NaHCO₃, and NaCl. These solutions were dipcoated or dropcasted onto substrates five minutes after solution formation. The substrates were allowed to dry under ambient conditions and then subjected to a low temperature thermal chemical vapor deposition process in which hydrogen was flushed through the sample during temperature ramp to 480° C. Subsequently a 1 to 1 ratio of CO₂ and C₂H₂ gas mixture was flowed through the tube, resulting in carbon deposition through an oxidative dehydrogenation reaction. Scanning electron micrographs (SEM) were taken of the fabrics for each growth attempt, which showed conformal coating of carbon nanotubes around each fiber as seen in FIG. 17. Transmission electron microscopy was also performed along with electron energy loss spectroscopy on the nanostructures to confirm carbon based tube morphology. To test for growth from contaminants, NaOH dipcoated fiber samples were subjected to the initial reduction step inside the CVD furnace and stopped immediately before carbon gas introduction. These specimens were then analyzed under Energy Dispersive X-ray Spectroscopy (EDS) mapping in SEM, demonstrating that the catalyst particles formed contained large counts of Na and O and no common transition metal catalysts (nickel, iron, and cobalt were not observed). Other substrates were also successfully used (while utilizing sodium for catalyzing CNT growth), as shown in FIG. 18. Fabric systems such as alumina fibers and unsized and polymer-sized (coated) carbon fibers both yielded CNT growth. Sodium was also effective in promoting growth of CNT on flat substrates, including but not limited to silicon nitride TEM grids, silicon wafer chips, and titanium sheets. For each of these processes, a 0.18 M NaOH in methanol solution was drop-casted/spin coated to allow for an even deposition. TEM was performed for each sample to confirm the tubular morphology of the carbon nanostructure.

Growth temperatures were also varied from 390° C. to 820° C. while keeping all other treatments constant, such as the 15-minute growth duration. As shown in FIG. 19, CNTs were observed to be longer and exhibit more curled structures at higher temperatures. CNTs were also observed to have other morphologies, such as open-ended morphologies that lacked catalyst particles and half-filled hollow morphologies.

In one set of experiments, the ratio of C₂H₂ to CO₂ was varied. As shown in FIG. 20, decreasing concentrations of C₂H₂ and increasing concentrations of CO₂ resulted in the formation of CNTs with lower tortuosities.

Extensive TEM and energy dispersive X-ray spectroscopy (EDS) after 15 minutes of CNT growth did not reveal clear particles attached to either the base or tip of the tube (see FIG. 21). Scans across the full length of tubes also did not reveal contaminant particles such as iron or nickel. Additionally, no sodium particles were found directly attached to the tube. Instead, scanning transmission electron microscopy revealed a somewhat brighter region on the inner wall of the CNT. Small area EDS scans of the lining compared with the adjacent outer wall revealed that a higher concentration of sodium existed on the interior of the tube, and showed that sodium residues lined the interior of the CNTs. In some cases, no sharp Na spike near the walls of the tubes was observed.

To better find the sodium catalyst particle for characterization through ex situ experimentation, CVD was performed on NaOH-dropcasted silicon nitride TEM grids for different growth durations. Specimens that had only been reduced with hydrogen (and had no exposure to CO₂ and C₂H₂) resulted in the formation of sodium-based nanoparticles. These particles were observed to have strong electron beam interactions, often disappearing after several minutes of imaging. Meanwhile, exposing the specimens to CO₂ and C₂H₂ for 15 minutes resulted in tubes with no particles attached (FIG. 21). However, growths that were terminated at low times at 1.9 and 3.8 minutes revealed the presence of clear particles at the base of newly nucleated tubes. EDS scans on these particles revealed large concentrations of sodium. Additionally, these particles disappeared upon longer beam imaging. Some scalloping could also be found on the interior of the tubes.

In situ TEM was performed using an environmental transmission electron microscope (ETEM). During ETEM experiments, NaOH-dropcasted silicon nitride TEM grids were heated to 480° C. and flown with the following gas feedstocks: 0.4 sccm H₂ during a 5 minute ramp from 25° C. to 480° C. followed by 0.1 sccm CO₂ and 0.1 sccm C₂H₂ at 480° C. for 30 minutes. Then, the sample was cooled to room temperature in the absence of any gas flow. Care was taken to achieve as close of a process match to the tube furnace as possible. Growth of carbon nanostructures was successfully achieved while performing real-time imaging and characterization. Structures grown in the ETEM chamber were primarily solid and contained a core-shell structure of carbon walls surrounding a sodium carbonate interior. However, upon performing an electron energy loss spectroscopy (EELS) line scan across the structure, a clear core shell structure was observed: high intensities of carbon walls were detected on the outside of the structure, filled with a core with large counts of sodium and carbonate oxygen and carbon. While solid, these structures are closely related to the hollow CNT found in ex situ results with sodium inner wall residues.

Further imaging of the solid carbon nanostructure formed inside the ETEM yielded a previously unobserved phenomenon, shown in FIG. 22. The sodium-rich core of the nanostructure started to deplete from the tip of the tube and descended along the length of the tube towards the base. Subsequently, at longer beam exposures, the attached sodium particle at the base of the tube also disappeared and rose up to reach the first depletion front to hollow out the structure, forming a CNT that was virtually identical to that observed in ex situ experiments. In addition, preliminary work has also shown that alkali metals with similar chemical reactivity such as potassium can catalyze growth of CNT in similar CVD environments.

While several embodiments of the present invention have been described and illustrated herein, those of ordinary skill in the art will readily envision a variety of other means and/or structures for performing the functions and/or obtaining the results and/or one or more of the advantages described herein, and each of such variations and/or modifications is deemed to be within the scope of the present invention. More generally, those skilled in the art will readily appreciate that all parameters, dimensions, materials, and configurations described herein are meant to be exemplary and that the actual parameters, dimensions, materials, and/or configurations will depend upon the specific application or applications for which the teachings of the present invention is/are used. Those skilled in the art will recognize, or be able to ascertain using no more than routine experimentation, many equivalents to the specific embodiments of the invention described herein. It is, therefore, to be understood that the foregoing embodiments are presented by way of example only and that, within the scope of the appended claims and equivalents thereto, the invention may be practiced otherwise than as specifically described and claimed. The present invention is directed to each individual feature, system, article, material, and/or method described herein. In addition, any combination of two or more such features, systems, articles, materials, and/or methods, if such features, systems, articles, materials, and/or methods are not mutually inconsistent, is included within the scope of the present invention.

The indefinite articles “a” and “an,” as used herein in the specification and in the claims, unless clearly indicated to the contrary, should be understood to mean “at least one.”

The phrase “and/or,” as used herein in the specification and in the claims, should be understood to mean “either or both” of the elements so conjoined, i.e., elements that are conjunctively present in some cases and disjunctively present in other cases. Other elements may optionally be present other than the elements specifically identified by the “and/or” clause, whether related or unrelated to those elements specifically identified unless clearly indicated to the contrary. Thus, as a non-limiting example, a reference to “A and/or B,” when used in conjunction with open-ended language such as “comprising” can refer, in one embodiment, to A without B (optionally including elements other than B); in another embodiment, to B without A (optionally including elements other than A); in yet another embodiment, to both A and B (optionally including other elements); etc.

As used herein in the specification and in the claims, “or” should be understood to have the same meaning as “and/or” as defined above. For example, when separating items in a list, “or” or “and/or” shall be interpreted as being inclusive, i.e., the inclusion of at least one, but also including more than one, of a number or list of elements, and, optionally, additional unlisted items. Only terms clearly indicated to the contrary, such as “only one of” or “exactly one of,” or, when used in the claims, “consisting of,” will refer to the inclusion of exactly one element of a number or list of elements. In general, the term “or” as used herein shall only be interpreted as indicating exclusive alternatives (i.e. “one or the other but not both”) when preceded by terms of exclusivity, such as “either,” “one of,” “only one of,” or “exactly one of.” “Consisting essentially of,” when used in the claims, shall have its ordinary meaning as used in the field of patent law.

As used herein in the specification and in the claims, the phrase “at least one,” in reference to a list of one or more elements, should be understood to mean at least one element selected from any one or more of the elements in the list of elements, but not necessarily including at least one of each and every element specifically listed within the list of elements and not excluding any combinations of elements in the list of elements. This definition also allows that elements may optionally be present other than the elements specifically identified within the list of elements to which the phrase “at least one” refers, whether related or unrelated to those elements specifically identified. Thus, as a non-limiting example, “at least one of A and B” (or, equivalently, “at least one of A or B,” or, equivalently “at least one of A and/or B”) can refer, in one embodiment, to at least one, optionally including more than one, A, with no B present (and optionally including elements other than B); in another embodiment, to at least one, optionally including more than one, B, with no A present (and optionally including elements other than A); in yet another embodiment, to at least one, optionally including more than one, A, and at least one, optionally including more than one, B (and optionally including other elements); etc.

In the claims, as well as in the specification above, all transitional phrases such as “comprising,” “including,” “carrying,” “having,” “containing,” “involving,” “holding,” and the like are to be understood to be open-ended, i.e., to mean including but not limited to. Only the transitional phrases “consisting of” and “consisting essentially of” shall be closed or semi-closed transitional phrases, respectively, as set forth in the United States Patent Office Manual of Patent Examining Procedures, Section 2111.03. 

The invention claimed is:
 1. A method of growing carbon-based nanostructures, comprising: exposing a precursor of the carbon-based nanostructures to an active growth material comprising at least one of an alkali metal and an alkaline earth metal to grow the carbon-based nanostructures from the precursor of the carbon-based nanostructures, wherein: the active growth material is at a temperature of less than or equal to 500° C. during the growth of the carbon-based nanostructures; the active growth material does not contain iron or contains iron in an amount such that the ratio of the number of atoms of iron in the active growth material to the combined number of atoms of any alkali metals and any alkaline earth metals in the active growth material is less than or equal to 3.5; and the active growth material, or a precursor thereof, comprises at least one of a bicarbonate salt of an alkaline earth metal and a bicarbonate salt of an alkali metal.
 2. The method of claim 1, wherein the active growth material comprises an alkaline earth metal.
 3. The method of claim 1, wherein the active growth material comprises an alkali metal.
 4. The method of claim 1, wherein the active growth material comprises at least one of sodium and potassium.
 5. The method of claim 1, wherein the active growth material, or a precursor thereof, comprises at least one of a hydroxide salt of an alkaline earth metal and a hydroxide salt of an alkali metal.
 6. The method of claim 1, wherein the active growth material, or a precursor thereof, comprises at least one of a carbonate salt of an alkaline earth metal and a carbonate salt of an alkali metal.
 7. The method of claim 1, wherein at least 50% of the carbon-based nanostructures that are grown are in direct contact with the at least one of an alkali metal and an alkaline earth metal.
 8. The method of claim 1, wherein the active growth material is supported on a polymeric substrate.
 9. The method of claim 1, wherein the active growth material is supported on one or more of a carbon fiber, a glass fiber, and an alumina fiber.
 10. The method of claim 1, wherein the active growth material is supported on a sized carbon fiber.
 11. The method of claim 1, wherein the active growth material is supported on at least one of a prepreg, a tow, and a weave.
 12. The method of claim 1, wherein the precursor of the carbon-based nanostructures comprises acetylene.
 13. The method of claim 1, wherein the precursor of the carbon-based nanostructures comprises carbon dioxide.
 14. The method of claim 1, wherein the precursor of the carbon based-nanostructures comprises at least one of a hydrocarbon and an alcohol.
 15. The method of claim 1, wherein the carbon-based nanostructures comprise at least one of carbon nanotubes, carbon nanofibers, and carbon nanowires.
 16. The method of claim 1, wherein the active growth material comprises a bicarbonate salt of an alkali metal.
 17. The method of claim 16, wherein the precursor of the active growth material comprises a bicarbonate salt of an alkali metal.
 18. The method of claim 16, wherein the active growth material comprises a bicarbonate salt of an alkaline earth metal. 